CONFERENCE PROCEEDINGS
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Lars Kjellberg
at Mycronic Ab
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 6 December 2004 Paper
FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator
Johan Karlsson, Kezhao Xing, Adisa Bajramovic, Henrik Dahlberg, Charles Bjornberg, Peter Hogfeldt, Lars Kjellberg, Hans Fosshaug, Anna Dahlberg, Axel Lundvall
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569653
KEYWORDS: Etching, Dry etching, Photomasks, Diffractive optical elements, Reactive ion etching, Deep ultraviolet, Photoresist processing, Lithography, Image resolution, Manufacturing
Proceedings Article | 20 August 2004 Paper
Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator
Henrik Sjoberg, Jean-Michel Chauvet, Jan Harkesjo, Peter Hogfeldt, Andrzej Karawajczyk, Johan Karlsson, Lars Kjellberg, Jonas Mahlen, Angela Beyerl, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren, Johan Aman
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557805
KEYWORDS: Photomasks, Spatial light modulators, Manufacturing, Deep ultraviolet, Printing, Raster graphics, Laser applications, Lithography, Image processing, Solids
Proceedings Article | 19 July 2000 Paper
Results from a new laser pattern generator for 180-nm photomasks
Tomas Vikholm, Lars Kjellberg, Per Askebjer, Steven Haddleton, Johan Larsson, Mans Bjuggren
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392080
KEYWORDS: Photomasks, Acousto-optics, Laser systems engineering, Control systems, Modulation, Optical proximity correction, Dry etching, Critical dimension metrology, Calibration, Image registration
Proceedings Article | 30 December 1999 Paper
CD performance of a new high-resolution laser pattern generator
Per Liden, Tomas Vikholm, Lars Kjellberg, Mans Bjuggren, Klas Edgren, John-Oscar Larson, Steven Haddleton, Per Askebjer
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373335
KEYWORDS: Photomasks, Calibration, Critical dimension metrology, Bragg cells, Signal detection, Lithography, Acousto-optics, Image quality, Control systems, Modulation
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