Dr. Laurent Pain
Patterning Program Manager at CEA-LETI
SPIE Involvement:
Conference Program Committee | Author
Publications (60)

Proceedings Article | 16 August 2019 Presentation
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Switching, Maskless lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Thin films, Etching, Ultraviolet radiation, Silicon, Coating, Nanoimprint lithography, Semiconducting wafers, Adhesives

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Wet etching, Critical dimension metrology, System on a chip, HF etching, Tin

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Metrology, Scatterometry, Machine learning, Maskless lithography, Reflectance spectroscopy, Electron beam direct write lithography, Semiconducting wafers, Inverse optics, Channel projecting optics

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silicon, Scanning electron microscopy, Optical scanning, Line width roughness, Optical alignment, Semiconducting wafers, Prototyping, Overlay metrology

Showing 5 of 60 publications
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