This paper develops a probe scanning AFM system for 12-inch wafer surface topography characterization. Firstly, a fast Gaussian filter convolution algorithm for 2D and 3D surface roughness is proposed, and the computation time is reduced by iterative approach. Second, the principle of AFM and the roughness measurement method are investigated. Finally, the same wafer is compared and measured using AFM and white light interferometer. The results show that the measurement error of the AFM is around 0.5% and the repeatability of the measurement is controlled in the order of picometer if the white light interferometer measurement is used as the reference value. In addition, the atomic force microscopy measurement method has the characteristics of high measurement accuracy, small measurement range, slow speed and no requirement for material, which provides technical support for process personnel how to choose the measurement scheme.
KEYWORDS: Film thickness, Thin films, Scanning electron microscopy, Ellipsometry, Electron microscopes, Nanofilms, Reflection, Systems modeling, Dispersion, Mathematical modeling
In this paper, ellipsometer combined with scanning electron microscope for solving the complex refractive index of nano film is proposed. Firstly, the interface of the nano film was measured using scanning electron microscope to obtain its thickness. Next, measure the parameters of the ellipsometer to establish the corresponding mathematical model and obtain the characteristic parameters of the thin film. Then, optimize the ellipsoidal mathematical model by comparing the film thickness obtained by scanning electron microscopy with that obtained by ellipsometry. Ultimately obtaining accurate film thickness and optical constants. The results show that the relative error of the calculation result of the optical properties is less than 1.0 nm and the measured values of optical constants are also consistent with the theoretical values. At the same time, the results derived from our method are in better agreement with the standard value, which shows that the measurement results are true and effective. Therefore, this method reveals the possibility of high-precision measurement of nano film through ellipsometer and scanning electron microscope, and makes it be a much better option to be employed for further micro-nano structures analysis applications.
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