Dr. Lei Zhang Profile

Dr. Lei Zhang

at DuPont Specialty Products USA, LLC

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 1 May 2023 Presentation + Paper

Understanding etch properties of advanced chemically amplified EUV resist

Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang

Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178

KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

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Proceedings Article | 25 May 2022 Presentation + Paper

Thickness dependence of properties of EUV underlayer thin films

Jae Hwan Sim, Yoo-Jin Ghang, Jung-June Lee, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen, James Marsh, Lei Zhang

Proceedings Volume 12055, 120550B (2022) https://doi.org/10.1117/12.2613437

KEYWORDS: Thin films, Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Chemical analysis, Silicon

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Proceedings Article | 23 March 2020 Paper

Design considerations for high etch resistance spin-on carbon underlayers

Li Cui, Iou-Sheng Ke, Anton Chavez, Keren Zhang, Paul LaBeaume, Suzanne Coley, Shintaro Yamada, Jim Cameron, Lei Zhang, William Marshall, Benjamin Foltz

Proceedings Volume 11326, 113261N (2020) https://doi.org/10.1117/12.2552024

KEYWORDS: System on a chip, Polymers, Etching, Resistance, Carbon, Polymer thin films, X-rays, FT-IR spectroscopy, Reactive ion etching

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Proceedings Article | 25 March 2019 Paper

High temperature spin on carbon materials with excellent planarization and CVD compatibility

Keren Zhang, Li Cui, Shintaro Yamada, Jim Cameron, Sabrina Wong, Lawrence Chen, Suzanne Coley, Dan Greene, Joshua Kaitz, Iou-Sheng Ke, Bhooshan Popere, Paul LaBeaume, Benjamin Foltz, Lei Zhang, Kenneth Kearns, Johnpeter Ngunjiri

Proceedings Volume 10960, 1096019 (2019) https://doi.org/10.1117/12.2514968

KEYWORDS: Chemical vapor deposition, Carbon, Polymers, Resistance, Coating, Etching, 193nm lithography, Materials

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