Dr. Li-Jui Chen Profile

Dr. Li-Jui Chen

Principal Engineer at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 20 March 2018 Presentation + Paper

Presentation + Paper

Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin

Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387

KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

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Proceedings Article | 20 April 2011 Paper

Paper

Overlay and focus stability control for 28-nm nodes on immersion scanners

Guo-Tsai Huang, Kai-Hsiung Chen, Li-Jui Chen, Tsai-Sheng Gau, Reiner Jungblut, Albert Chen, Ethan Lee, Lester Wang, Miranda Un, Wei-Shun Tzeng, Jim Chen, Spencer Lin, Jon Wu

Proceedings Volume 7971, 79711M (2011) https://doi.org/10.1117/12.879055

KEYWORDS: Scanners, Semiconducting wafers, Metrology, Overlay metrology, Feedback control, Lithography, Finite element methods, Control systems, Scatterometry, Data modeling

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Proceedings Article | 2 April 2010 Paper

Paper

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

C. Ke, Victor Shih, Jacky Huang, L. Chen, Willie Wang, G. Huang, W. Yang, Sophia Wang, C. Liang, H. Liu, H. Lee, L. Terng, T. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Marc Noot, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Gavin Liu, Wei-Shun Tzeng, Jim Chen, Andreas Fuchs, Omer Adam, Cathy Wang

Proceedings Volume 7638, 76383P (2010) https://doi.org/10.1117/12.853318

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Scanners, Back end of line, Lithography, 3D metrology, Finite element methods, Scatterometry, Critical dimension metrology

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Proceedings Article | 11 December 2009 Paper

Paper

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Victor Shih, Jacky Huang, Willie Wang, G. T. Huang, H. L. Chung, Alan Ho, W. T. Yang, Sophia Wang, Chih-Ming Ke, L. J. Chen, C. R. Liang, H. H. Liu, H. J. Lee, L. G. Terng, T. S. Gau, John Lin, Kaustuve Bhattacharyya, Maurits van der Schaar, Noelle Wright, Mir Shahrjerdy, Vivien Wang, Spencer Lin, Jon Wu, Sophie Peng, Dennis Chang, Cathy Wang, Andreas Fuchs, Omer Adam, Karel van der Mast

Proceedings Volume 7520, 75201A (2009) https://doi.org/10.1117/12.837353

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Lithography, Back end of line, Metals, Scatterometry, Front end of line, Signal to noise ratio

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Proceedings Article | 27 March 2007 Paper

Paper

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Fu-Jye Liang, Hsing Chang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn J. Lin

Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531

KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

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Proceedings Article | 27 March 2007 Paper

Paper

Effects of laser bandwidth on iso-dense bias and line-end shortening at sub-micron process nodes

R. Peng, A. Yang, L. Chen, Y. Guo, H. Liu, John Lin

Proceedings Volume 6520, 65203S (2007) https://doi.org/10.1117/12.713080

KEYWORDS: Laser energy, Semiconducting wafers, Laser scanners, 3D scanning, Lithography, Etching, Critical dimension metrology, Metrology, Scanning electron microscopy, Laser applications

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Proceedings Article | 26 March 2007 Paper

Paper

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Lin-Hung Shiu, Fu-Jye Liang, Hsing Chang, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527

KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

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SPIE Journal Paper | 1 January 2007 Open Access

Open Access

Defect reduction with special routing for immersion lithography

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941

KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

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Proceedings Article | 12 May 2005 Paper

Paper

Characterization of ArF immersion process for production

Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602025

KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Lithography, Overlay metrology, Prototyping, Microfluidics, Water, Finite element methods

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Proceedings Article | 28 May 2004 Paper

Paper

General scaling law of optical lithography: optical theory

Chun-Kuang Chen, Tsai-Sheng Gau, Li-Jui Chen, Chi-Chuang Lee, Jaw-Jung Shin, Anthony Yen, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536667

KEYWORDS: Optical lithography, Optics manufacturing, Manufacturing

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Proceedings Article | 2 June 2003 Paper

Paper

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Li-Jui Chen, Chih-Ming Ke, Shinn Sheng Yu, Tsai-Sheng Gau, Pei-Hung Chen, Yao Ching Ku, Burn Lin, Dan Engelhard, Dave Hetzer, Jason Yang, Kelly Barry, Lip Yap, Wenge Yang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483692

KEYWORDS: Scatterometry, Critical dimension metrology, Metrology, Lithography, Scanning electron microscopy, Semiconducting wafers, Deep ultraviolet, Scatter measurement, Reflectometry, Photoresist materials

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Proceedings Article | 2 June 2003 Paper

Paper

Characterization of charging in CD-SEM for 90-nm metrology and beyond

Li-Jui Chen, Shang-Wei Lin, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483690

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image quality, Optical proximity correction, Distance measurement, Scanning electron microscopy, Metrology, Time metrology, Electron beams, Electrons

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Proceedings Article | 14 September 2001 Paper

Paper

Lithography challenges of dual-damascence process in 0.13 um era

Li-Jui Chen, Lin-Hung Shiu, Chern-Shyan Tsai, Ching-Hsu Chang, Tsung-Kuei Kang, Shuo-Yen Chou

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435791

KEYWORDS: Reflectivity, Etching, Image processing, Lithography, Photoresist processing, Optical lithography, Critical dimension metrology, Coating, Polymers, Dielectrics

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Proceedings Article | 14 September 2001 Paper

Paper

Evaluating the impact of spherical aberration on sub-0.2-um contact/via hole patterning

Shuo-Yen Chou, Jen-Chung Lou, Chih-Ming Lai, Fu-Jye Liang, Li-Jui Chen

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435668

KEYWORDS: Monochromatic aberrations, Photomasks, Lithography, Phase shifts, Lithographic illumination, Optical lithography, Critical dimension metrology, Electroluminescence, Printing, Diffraction

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Proceedings Article | 24 August 2001 Paper

Paper

Novel negative photoresist process for 0.18 um dual damascene

Lin-Hung Shiu, Chih-Ming Lai, Fu-Jye Liang, Hung-Chun Chen, Li-Jui Chen, Shuo-Yen Chou

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436891

KEYWORDS: Photoresist processing, Scanning electron microscopy, Etching, Copper, Resolution enhancement technologies, Bottom antireflective coatings, Photomasks, Photoresist materials, Phase shifts, Aluminum

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Proceedings Article | 30 December 1999 Paper

Paper

High-transmission PSM inspection sensitivity

Chunhung Wu, David Wang, Chien-Ming Wang, Li-Jui Chen, Shuo-Yen Chou, Clare Wu, Nathan Schumann, Reuven Falah, Wolfgang Staud

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373307

KEYWORDS: Inspection, Scattering, Optical proximity correction, Photomasks, Transmittance, Reticles, Glasses, Binary data, Critical dimension metrology, Phase shifts

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Proceedings Article | 26 July 1999 Paper

Paper

Customized off-axis illumination aperture filtering for sub-0.18-um KrF lithography

Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354354

KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

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Proceedings Article | 26 July 1999 Paper

Paper

Antireflection strategies for sub-0.18-um dual-damascene structure patterning in KrF 248-nm lithography

Shuo-Yen Chou, Chien-Ming Wang, Chin Hsia, Li-Jui Chen, Gue-Wuu Hwang, Shyh-Dar Lee, Jen-Chung Lou

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354410

KEYWORDS: Reflectivity, Critical dimension metrology, Oxides, Semiconducting wafers, Refractive index, Optical lithography, Lithography, Photoresist materials, Dielectrics, Silicon

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Showing 5 of 18 publications

Conference Committee Involvement (5)

Extreme Ultraviolet (EUV) Lithography VII

22 February 2016 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography VI

23 February 2015 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography V

24 February 2014 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

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