Li Wei Chen
at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Etching, Image segmentation, Scanners, Signal processing, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers, Double positive medium

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