Dr. Lieve van Look
Researcher at imec
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 13 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

Proceedings Article | 29 November 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Critical dimension metrology, Etching, Stochastic processes, Failure analysis, Optical correlators, Cadmium, Finite element methods, Inspection, Metrology, Defect detection

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Extreme ultraviolet lithography, Metals, Photomasks, Semiconducting wafers, Nanoimprint lithography, Optical proximity correction, Extreme ultraviolet, Phase modulation, Phase shift keying

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, High volume manufacturing, Critical dimension metrology, Inspection, Logic

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Metrology, Extreme ultraviolet, Stochastic processes

Showing 5 of 36 publications
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