Dr. Linus Jang Profile

Dr. Linus Jang

Technical Chief of Staff at ASML Hillsboro

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Author

Publications (3)

Proceedings Article | 27 March 2014 Paper

Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmask

Linus Jang, Young Joon Moon, Ryoung-Han Kim, Christopher Bencher, Huixiong Dai, Peng Xie, Daniel Diehl, Yong Cao, Wilson Zeng, Christopher Ngai

Proceedings Volume 9051, 90510Y (2014) https://doi.org/10.1117/12.2046107

KEYWORDS: Photoresist materials, Optical lithography, Etching, Lithography, Semiconducting wafers, Silicon, System on a chip, Double patterning technology, Manufacturing, Reflectivity

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Proceedings Article | 23 March 2012 Paper

Computational study of line tip printability of sub-20-nm technology

Lei Yuan, Thomas Wallow, Deniz Civay, Linus Jang, Jongwook Kye, Harry Levinson, Sohan Singh, Mark Kelling

Proceedings Volume 8322, 832229 (2012) https://doi.org/10.1117/12.915868

KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Photomasks, Lithographic illumination, Double patterning technology, Line edge roughness, Metals

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Proceedings Article | 15 March 2012 Paper

SADP for BEOL using chemical slimming with resist mandrel for beyond 22nm nodes

Linus Jang, Sudhar Raghunathan, E. Todd Ryan, Jongwook Kye, Harry Levinson, Shannon Dunn, David Hetzer, Shinichiro Kawakami, Lior Huli

Proceedings Volume 8325, 83250D (2012) https://doi.org/10.1117/12.916952

KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Oxides, Photoresist processing, Critical dimension metrology, Chemical reactions, Fermium, Frequency modulation, Scanning electron microscopy

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