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Lionel Ravel
Process module integration at STMicroelectronics
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Publications (1)
Proceedings Article | 14 October 2011 Paper
Anticipation of dimensional issues caused by topography during photo lithography
Lionel Ravel, Christophe Brault, Chloé Hegaret, Antonio Di Giacomo, Romain Lallement, Jérôme Azémar, Marie Hellion
Proceedings Volume 8166, 81663J (2011) https://doi.org/10.1117/12.896827
KEYWORDS: Transistors, Critical dimension metrology, Photomasks, Lithography, Optical proximity correction, Etching, Reflectivity, Photoresist materials, Semiconducting wafers, Scanning electron microscopy
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