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Louis Lin
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
OPC
Websites:
Company Website
Publications (1)
Proceedings Article | 9 September 2013 Paper
High-fidelity dummy fill printing with repair OPC
Louis Lin, Wei-Long Wang, Sarah McGowan
Proceedings Volume 8880, 88801K (2013) https://doi.org/10.1117/12.2022009
KEYWORDS: Optical proximity correction, Model-based design, Printing, Semiconducting wafers, Photomasks, Image quality, Bessel functions, Image processing, SRAF, Wafer-level optics
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