Louis Markoya
Engineer at ASML
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 7 March 2008 Paper
Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Rogier Cortie, Ralph Meijers, Fabrizio Evangelista, Nandarisi Samarakone
Proceedings Volume 6924, 692415 (2008) https://doi.org/10.1117/12.773071
KEYWORDS: Semiconducting wafers, Water, Contamination, Absorption, Microfluidics, Immersion lithography, Transparency, Optical components, Ultraviolet radiation, Pulsed laser operation

Proceedings Article | 27 March 2007 Paper
Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Nandasiri Samarakone, Rudiger Duesing
Proceedings Volume 6520, 65201M (2007) https://doi.org/10.1117/12.711139
KEYWORDS: Microfluidics, Absorption, Semiconducting wafers, Neodymium, Water, Immersion lithography, Refractive index, Critical dimension metrology, Glasses, Contamination

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615406 (2006) https://doi.org/10.1117/12.657574
KEYWORDS: Semiconducting wafers, Neodymium, Refractive index, Water, Immersion lithography, Microfluidics, Optical lithography, Critical dimension metrology, Absorption, Glasses

SPIE Journal Paper | 1 July 2005
Roger French, Harry Sewell, Min Yang, Sheng Peng, Diane McCafferty, Weiming Qiu, Robert Wheland, Michael Lemon, Louis Markoya, Michael Crawford
JM3, Vol. 4, Issue 03, 031103, (July 2005) https://doi.org/10.1117/12.10.1117/1.2039953
KEYWORDS: Refractive index, Water, Oscillators, Absorption, Absorbance, Lithography, Immersion lithography, Microfluidics, Microfluidic imaging, Glasses

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601012
KEYWORDS: Refractive index, Immersion lithography, Lithography, Polarization, Water, Image resolution, Imaging systems, Printing, Glasses, Absorption

Showing 5 of 6 publications
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