Dr. Lutz Parthier Profile

Dr. Lutz Parthier

Manager R&D at SCHOTT AG

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 31 December 2009 Paper

Study of haze in 193nm high dose irradiated CaF2 crystals

Ute Natura, Stephan Rix, Martin Letz, Lutz Parthier

Proceedings Volume 7504, 75041P (2009) https://doi.org/10.1117/12.836409

KEYWORDS: Laser scattering, Scattering, Absorption, Refractive index, Annealing, Mie scattering, Air contamination, Crystals, Calcium, Laser crystals

Read Abstract +

Proceedings Article | 31 December 2009 Paper

A microscopic model for long-term laser damage in calcium fluoride

Stephan Rix, Ute Natura, Martin Letz, Claudia Felser, Lutz Parthier

Proceedings Volume 7504, 75040J (2009) https://doi.org/10.1117/12.836404

KEYWORDS: Diffusion, Calcium, Ions, Laser induced damage, Crystals, Phonons, Fluorine, Deep ultraviolet, Silver, Laser irradiation

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Investigations regarding the prevention of depolarization of ArF excimer laser irradiation by CaF₂ laser optics

Ute Natura, Dietmar Keutel, Martin Letz, Lutz Parthier, Konrad Knapp

Proceedings Volume 6520, 652030 (2007) https://doi.org/10.1117/12.712108

KEYWORDS: Polarization, Crystals, Temperature metrology, Laser crystals, Excimer lasers, Laser optics, Birefringence, Calcium, Laser irradiation, Optical properties

Read Abstract +

Proceedings Article | 31 August 2005 Paper

Investigating the ArF laser stability of CaF2 at elevated fluences

A. Burkert, Ch. Muehlig, W. Triebel, D. Keutel, U. Natura, L. Parthier, S. Gliech, S. Schroeder, A. Duparre

Proceedings Volume 5878, 58780E (2005) https://doi.org/10.1117/12.616904

KEYWORDS: Absorption, Scattering, Laser induced fluorescence, Laser scattering, Laser irradiation, Laser stabilization, Excimers, Light scattering, Luminescence, Excimer lasers

Read Abstract +

Proceedings Article | 21 February 2005 Paper

Analysis of laser durability of CaF2 for optical lithography

Guenter Grabosch, Lutz Parthier, Ute Natura, Karin Poehl, Martin Letz, Christian Muehlig, Konrad Knapp

Proceedings Volume 5647, (2005) https://doi.org/10.1117/12.585247

KEYWORDS: Optical lithography, Silver, Lithography, Semiconductors, Semiconductor lasers, Laser applications, Lenses, Immersion lithography, Laser induced damage, Biological research

Read Abstract +

Proceedings Article | 10 September 2004 Paper

Bulk absorption measurements of highly transparent DUV/VUV optical materials

Christian Muhlig, Siegfried Kufert, Wolfgang Triebel, Frank Coriand, Lutz Parthier, Andreas Voitsch

Proceedings Volume 5457, (2004) https://doi.org/10.1117/12.545601

KEYWORDS: Absorption, Laser induced damage, Silica, Calcium, Luminescence, Laser irradiation, Laser induced fluorescence, Excimer lasers, Oxygen, Laser beam diagnostics

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Strong improvement of critical parameters of CaF2 lens blanks for 193-nm and 157-nm lithography

Guenter Grabosch, Lutz Parthier, Peter Kruell, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536310

KEYWORDS: Annealing, Crystals, Lens blanks, Refractive index, Lithography, Wavefronts, Photovoltaics, 193nm lithography, Birefringence, Quantitative analysis

Read Abstract +

Proceedings Article | 28 May 2004 Paper

CaF2 for DUV lens fabrication: basic material properties and dynamic light-matter interaction

Martin Letz, Axel Engel, Wolfgang Mannstadt, Lutz Parthier, Ute Natura, Konrad Knapp

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536666

KEYWORDS: Ions, Crystals, Absorption, Deep ultraviolet, Distortion, Electron holes, Optical properties, Chemical species, Glasses, Temperature metrology

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Optical anisotropy in the cubic crystal of CaF2: scaling arguments and their relation to dispersing absorption

Martin Letz, A. Gottwald, M. Richter, Matthias Brinkmann, G. Wehrhan, Lutz Parthier

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485467

KEYWORDS: Anisotropy, Crystals, Excitons, Absorption, Dielectrics, Dispersion, Crystal optics, Electromagnetic radiation, Deep ultraviolet, Birefringence

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Critical enabling properties of CaF2 lens blanks for state-of-the-art lithography tools

Joerg Hahn, Guenter Grabosch, Lutz Parthier, Konrad Knapp

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485417

KEYWORDS: Birefringence, Lens blanks, Refractive index, Lithography, Annealing, Crystals, Lens design, Manufacturing, 193nm lithography, Image quality

Read Abstract +

SPIE Journal Paper | 1 April 2003

Short wavelength optical anisotropy in CaF₂ caused by exciton dispersion

Martin Letz, W. Mannstadt, Matthias Brinkmann, Lutz Parthier, G. Wehrhan, Ewald Moersen

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563262

KEYWORDS: Dielectrics, Anisotropy, Crystals, Absorption, Excitons, Birefringence, Electrons, Geometrical optics, Crystal optics, Dielectric polarization

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years