Mr. Mohamed Habib Profile

Mohamed Habib

at Siemens EDA

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Author

Publications (6)

Proceedings Article | 14 October 2011 Paper

OPC modeling and correction solutions for EUV lithography

James Word, Christian Zuniga, Michael Lam, Mohamed Habib, Kostas Adam, Michael Oliver

Proceedings Volume 8166, 81660Q (2011) https://doi.org/10.1117/12.899591

KEYWORDS: Optical proximity correction, Photomasks, Reticles, Extreme ultraviolet lithography, Model-based design, Reflectivity, 3D modeling, Extreme ultraviolet, Optical lithography, Semiconducting wafers

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Proceedings Article | 5 April 2011 Paper

EUV flare and proximity modeling and model-based correction

Christian Zuniga, Mohamed Habib, James Word, Gian Lorusso, Eric Hendrickx, Burak Baylav, Raghu Chalasani, Michael Lam

Proceedings Volume 7969, 79690T (2011) https://doi.org/10.1117/12.879488

KEYWORDS: Extreme ultraviolet, Optical proximity correction, Data modeling, Model-based design, Photomasks, Point spread functions, Calibration, Extreme ultraviolet lithography, Fractal analysis, 3D modeling

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SPIE Journal Paper | 1 October 2009

Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point-spread function, and flare map calibration

Gian Lorusso, Frieda Van Roey, Eric Hendrickx, Germain Fenger, Michael Lam, Christian Zuniga, Mohamed Habib, Hesham Diab, James Word

JM3, Vol. 8, Issue 04, 041505, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238515

KEYWORDS: Metrology, Fractal analysis, Point spread functions, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Calibration, Scanning electron microscopy, Visualization, Convolution

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Proceedings Article | 16 March 2009 Paper

Inverse vs. traditional OPC for the 22nm node

James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou, Hesham Diab, Mohamed Gheith, Mohamed Habib, Cynthia Zhu

Proceedings Volume 7274, 72743A (2009) https://doi.org/10.1117/12.814339

KEYWORDS: Optical proximity correction, Photomasks, Metals, Double patterning technology, Resolution enhancement technologies, Lithography, Manufacturing, Logic, Shape analysis, Visualization

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Proceedings Article | 17 October 2008 Paper

Adaptive automatic fragmentation

Mohamed Serag El-Din Habib

Proceedings Volume 7122, 712243 (2008) https://doi.org/10.1117/12.801508

KEYWORDS: Optical proximity correction, Photomasks, Prototyping, Resolution enhancement technologies, Image processing, Process modeling, Image enhancement, Image quality, Artificial intelligence, Manufacturing

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Proceedings Article | 17 October 2008 Paper

Enhancing OPC model stability and predictability using SEM image contours

Mohamed Serag El-Din Habib

Proceedings Volume 7122, 712244 (2008) https://doi.org/10.1117/12.801513

KEYWORDS: Process modeling, Calibration, Scanning electron microscopy, Image processing, Optical proximity correction, Data modeling, Optical calibration, Image enhancement, Cadmium, Statistical modeling

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Showing 5 of 6 publications

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