Maciej W. Rudzinski
Sr. Applications Dev Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Reticles, Manufacturing, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Phase contrast, Defect detection, Deep ultraviolet, Quartz, Manufacturing, Inspection, Photomasks, Computer aided design, Phase shifts

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Databases, Inspection, Photomasks, Algorithm development, Phase shifts, Defect inspection

Proceedings Article | 28 May 2003 Paper
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Phase contrast, Defect detection, Detection and tracking algorithms, Etching, Quartz, Inspection, Phase shift keying, Photomasks, Phase shifts

Showing 5 of 13 publications
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