Makiko Irie
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2008 Paper
Makiko Irie, Takako Suzuki, Takeyoshi Mimura, Takeshi Iwai
Proceedings Volume 6923, 692310 (2008) https://doi.org/10.1117/12.771120
KEYWORDS: Photomasks, Diffusion, Polymers, Extreme ultraviolet lithography, Polymer thin films, Manufacturing, Semiconducting wafers, Lithography, Light sources, Optical lithography

Proceedings Article | 29 March 2006 Paper
Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie
Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002
KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

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