Mr. Makoto Kozuma Profile

Makoto Kozuma

at Tekscend Photomask Chunghwa Inc.

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 15 May 2007 Paper

The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask

Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei

Proceedings Volume 6607, 660736 (2007) https://doi.org/10.1117/12.729025

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics

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Proceedings Article | 11 May 2007 Paper

Influence of environmental components on haze growth

Joseph Gordon, David Chan, Larry Frisa, Colleen Weins, Christian Chovino, John Keagy, Steve Mahoney, Frank Chen, Makoto Kozuma, Kyoko Kuroki, Takahiro Matsuura

Proceedings Volume 6607, 660707 (2007) https://doi.org/10.1117/12.728920

KEYWORDS: Air contamination, Photomasks, Reticles, Pellicles, Atmospheric particles, Sulfur, Gases, Nitrogen, Semiconducting wafers, Semiconductors

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Proceedings Article | 20 October 2006 Paper

The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask

Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei

Proceedings Volume 6349, 634954 (2006) https://doi.org/10.1117/12.692881

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics

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Proceedings Article | 20 October 2006 Paper

Non-chemical cleaning technology for sub-90nm design node photomask manufacturing

Star Hoyeh, Richard Chen, Makoto Kozuma, Joann Kuo, Torey Huang, Frank Chen

Proceedings Volume 6349, 63492U (2006) https://doi.org/10.1117/12.686075

KEYWORDS: Ozone, Scanning probe microscopy, Photomasks, Ions, Hydrogen, Reflectivity, Manufacturing, Particles, Plasma, Photoresist processing

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Proceedings Article | 8 November 2005 Paper

Advanced e-beam CAR resist evaluation for 65nm generation

Gordon Chan, Orson Lin, Wesen Tseng, Booky Lee, Torey Huang, Makoto Kozuma

Proceedings Volume 5992, 59923B (2005) https://doi.org/10.1117/12.632052

KEYWORDS: Critical dimension metrology, Photomasks, Line edge roughness, Photoresist processing, Etching, Manufacturing, Edge roughness, Chemically amplified resists, Tin, Electronics

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Proceedings Article | 28 June 2005 Paper

New slit scan developer system for advanced 45-nm mask making

Sharon Wang, Shinsuke Miyazaki, Makoto Kozuma

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617102

KEYWORDS: Critical dimension metrology, Photomasks, Process control, Mask making, Diffractive optical elements, Chemically amplified resists, Chromium, Electronics, Roads, Tolerancing

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Proceedings Article | 28 June 2005 Paper

Application of CPL mask for whole chip 65nm DRAM patterning

Orson Lin, Richard Hung, Booky Lee, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Jengping Lin, Michael Hsu, Stephen Hsu

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617230

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Manufacturing, Resolution enhancement technologies, Etching, Data modeling, Quartz, Chromium, Coating

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Proceedings Article | 27 January 2005 Paper

Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology

Booky Lee, Richard Hung, Orson Lin, Yuan-Hsun Wu, Makoto Kozuma, Chiang-Lin Shih, Michael Hsu, Stephen Hsu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576542

KEYWORDS: Photomasks, Etching, Neodymium, Coating, Quartz, Chromium, Optical alignment, Scanning electron microscopy, Contamination, Image processing

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Showing 5 of 8 publications

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