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Makoto Murai
at HOYA Corp
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Author
Publications (2)
Proceedings Article | 22 April 2011 Paper
Growth mechanism and inhibition technologies of a contamination on the surface of photomask for longtime LCD-TFT lithography process
Makoto Murai, Masayoshi Tsuchiya, Hiroyuki Shinchi, Terumasa Hirano, Shintaro Kitajima, Yasushi Kaneko, Takahisa Kimoto, Shigeki Takayama
Proceedings Volume 8081, 808105 (2011) https://doi.org/10.1117/12.897698
KEYWORDS: Contamination, Photomasks, Chromium, Pellicles, Oxides, Lithography, Absorbance, Glasses, Photoresist materials, Etching
Proceedings Article | 19 February 2003 Paper
Electron emission at an early stage of femtosecond pulsed laser ablation
Proceedings Volume 4830, (2003) https://doi.org/10.1117/12.486598
KEYWORDS: Laser ablation, Signal detection, Atmospheric particles, Pulsed laser operation, Metals, Copper, Laser irradiation, Particles, Femtosecond phenomena, Laser systems engineering
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