Ms. Malavika Sharma Profile

Malavika Sharma

at Mentor Graphics (India) Private Ltd

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Author

Publications (4)

Proceedings Article | 16 October 2019 Presentation + Paper

Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)

Charles Whiting, Ingo Bork, Peter Buck, Robin Chia, Bharadwaj Durvasula, Daniel Hill, Gazi Huda, Ken Jantzen, Matthew Leuthold, Jianliang Li, Joerg Mellmann, Kushlendra Mishra, Jed Rankin, Nageswara Rao, Malavika Sharma, Rachit Sharma, Adam Smith, Michaela Wentz

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 3 October 2019 Paper

Machine learning guided curvilinear MPC

Malavika Sharma, Bhardwaj Durvasula, Nageswara Rao, Ingo Bork, Rachit Sharma, Kushlendra Mishra, Peter Buck

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Lithography, Data modeling, Waveguides, Data processing, Neural networks, Photomasks, Machine learning, Computational lithography, Optical proximity correction, Vestigial sideband modulation

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Proceedings Article | 26 September 2019 Paper

Resist-slope aware modeling for mask process correction applications

Rachit Sharma, Ingo Bork, Kushlendra Mishra, ShiZhi Lyu, Linna Cong, Mingjing Tian, Malavika Sharma, Bhardwaj Durvasula, Nageswara Rao, Peter Buck

Proc. SPIE. 11148, Photomask Technology 2019

KEYWORDS: Scattering, Calibration, Etching, Control systems, Photomasks, Semiconductor manufacturing, Critical dimension metrology, Photoresist processing, Model-based design, Process modeling

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Proceedings Article | 31 October 2017 Presentation + Paper

CLMPC: curvilinear MPC in a mask data preparation flow

Ingo Bork, Murali Reddy, Bhardwaj Durvasula, Nageswara Rao, Malavika Sharma, Peter Buck

Proc. SPIE. 10451, Photomask Technology 2017

KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Model-based design

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