Ms. Mame-Kouna Top Profile

Mame-Kouna Top

at STMicroelectronics

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 2 April 2010 Paper

OPC model error study through mask and SEM measurement error

Mame Kouna Top, David Fuard, Vincent Farys, Patrick Schiavone

Proceedings Volume 7638, 76381Y (2010) https://doi.org/10.1117/12.848309

KEYWORDS: Scanning electron microscopy, Optical proximity correction, Metrology, Calibration, Data modeling, Inspection, Process control, Optical lithography, Current controlled current source, Atomic force microscopy

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Outliers detection by fuzzy classification method for model building

Mame Kouna Top, Yorick Trouiller, Vincent Farys, David Fuard, Emek Yesilada, Catherine Martinelli, Mazen Said, Franck Foussadier, Patrick Schiavone

Proceedings Volume 7272, 72721G (2009) https://doi.org/10.1117/12.812955

KEYWORDS: Mahalanobis distance, Critical dimension metrology, Optical proximity correction, Calibration, Fuzzy logic, Data modeling, Reliability, Scanning electron microscopy, Lithography, Optics manufacturing

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Impact of modelisation pixel size on OPC consistency

Franck Foussadier, Emek Yesilada, Jean-Christophe Le Denmat, Yorick Trouiller, Vincent Farys, Frédéric Robert, Gurwan Kerrien, Christian Gardin, Loic Perraud, Florent Vautrin, Alexandre Villaret, Catherine Martinelli, Jonathan Planchot, Jean Luc Di-Maria, Mazen Saied, Mame Kouna Top

Proceedings Volume 7274, 727416 (2009) https://doi.org/10.1117/12.814047

KEYWORDS: Optical proximity correction, Critical dimension metrology, Computer simulations, Optical simulations, Optical lithography, Current controlled current source, Optical imaging, Databases, Process modeling, Photomasks

Read Abstract +

Proceedings Article | 12 March 2008 Paper

Study of SRAF placement for contact at 45 nm and 32 nm node

V. Farys, F. Robert, C. Martinelli, Y. Trouiller, F. Sundermann, C. Gardin, J. Planchot, G. Kerrien, F. Vautrin, M. Saied, E. Yesilada, F. Foussadier, A. Villaret, L. Perraud, B. Vandewalle, J. C. Le Denmat, M. K. Top

Proceedings Volume 6924, 69242Z (2008) https://doi.org/10.1117/12.774091

KEYWORDS: SRAF, Optical proximity correction, Lithography, Eye, Photomasks, Immersion lithography, Manufacturing, Logic, Switching, Printing

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years