Manuel Jaramillo
Product Manager at Air Products and Chemicals Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Line width roughness, Semiconducting wafers, Lithography, Immersion lithography, Standards development, 193nm lithography, Critical dimension metrology, Line edge roughness, Image processing, Lutetium

Proceedings Article | 23 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Lithography, Immersion lithography, Finite element methods, Photoresist processing, Scanners, Scanning electron microscopy, Optical lithography

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Line width roughness, Photoresist processing, Lithography, Plasma, Critical dimension metrology, Scanning electron microscopy, Plasma etching

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Lithography, Photoresist processing, Optical proximity correction, Manufacturing, Reticles, Wafer-level optics, Control systems

Proceedings Article | 29 March 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Line width roughness, Electroluminescence, Semiconducting wafers, Image processing, Scanners, Platinum, Scanning electron microscopy, Critical dimension metrology, Image resolution, Resist chemistry

Showing 5 of 11 publications
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