Dr. Himel, an SPIE Fellow since 2010, received his BS degree in Physics from the California Polytechnic State University in 1984, his PhD in Optical Sciences from the University of Arizona in 1988, and an MBA from the University of Connecticut in 1998. Following his PhD, Dr. Himel worked as a Post Doctoral Research Associate at the Center for Research in Electro-Optics and Lasers at the University of Central Florida performing research on the characterization of thin-film coatings. For 14 years, he worked in the design and development of advanced lithography systems starting with three years at AT&T Bell Laboratories working on the development of Extreme Ultraviolet Lithography, followed by five years at SVG Lithography Systems working on excimer laser-based illumination systems, and eighteen years at DigitalOptics Corporation and Jenoptik Optical Systems where he concentrated his efforts on the application of diffractive micro-optics for advanced lithography, inspection, and consumer applications. Dr. Himel is currently the Senior Director of Design and Engineering at MKS Instruments - Newport Corporation. His research and development activity has resulted in over 46 published papers and five patents.
Visiting Lecture Topics

• Harnessing Light for a Better World