Dr. Marco H. P. Moers Profile

Dr. Marco H. P. Moers

Senior Designer

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 26 March 2007 Paper

The random contact hole solutions for future technology nodes

Alek Chen, Steve Hansen, Marco Moers, Jason Shieh, Andre Engelen, Koen van Ingen Schenau, Shih-en Tseng

Proceedings Volume 6520, 65201B (2007) https://doi.org/10.1117/12.712447

KEYWORDS: Photomasks, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Logic, Error analysis, Lithographic illumination, Optical lithography, Imaging systems

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Proceedings Article | 12 May 2005 Paper

Lithographic performance of a dual-stage 0.93NA ArF step and scan system

Rian Rubingh, Marco Moers, Manfred Suddendorf, Peter Vanoppen, Aernout Kisteman, Michael Thier, Vladan Blahnik, Eckhard Piper

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599805

KEYWORDS: Electroluminescence, Semiconducting wafers, Critical dimension metrology, Silver, Photomasks, Lithography, Control systems, Monochromatic aberrations, Imaging systems, Sensors

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Proceedings Article | 26 June 2003 Paper

Optimizing and enhancing optical systems to meet the low k₁ challenge

Donis Flagello, Robert Socha, Xuelong Shi, Jan van Schoot, Jan Baselmans, Mark van de Kerkhof, Wim de Boeij, Andre Engelen, Rene Carpaij, Oscar Noordman, Marco Moers, Melchior Mulder, Jo Finders, Henk van Greevenbroek, Martin Schriever, Manfred Maul, Helmut Haidner, Markus Goeppert, Ulrich Wegmann, Paul Graeupner

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485340

KEYWORDS: Lithographic illumination, Reticles, Wavefronts, Sensors, Semiconducting wafers, Light scattering, Lithography, Critical dimension metrology, Scanners, Control systems

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 14 September 2001 Paper

Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance

Marco Moers, Hans van der Laan, Mark Zellenrath, Wim de Boeij, Neil Beaudry, Kevin Cummings, Adriaan van Zwol, Arthur Brecht, Rob Willekers

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435676

KEYWORDS: Lithography, Reticles, Monochromatic aberrations, Spherical lenses, Scanning electron microscopy, Scanners, Phase shifts, Deep ultraviolet, Semiconducting wafers, Feature extraction

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Proceedings Article | 26 July 1999 Paper

ArF step-and-scan exposure system for 0.15-um and 0.13-um technology nodes

Jan Mulkens, Judon Stoeldraijer, Guy Davies, Marcel Dierichs, Barbra Heskamp, Marco Moers, Richard George, Oliver Roempp, Holger Glatzel, Christian Wagner, Ingrid Pollers, Patrick Jaenen

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354362

KEYWORDS: Semiconducting wafers, Reticles, Lithography, Imaging systems, Photomasks, Overlay metrology, Scanning electron microscopy, Photoresist processing, Monochromatic aberrations, Distortion

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Proceedings Article | 6 September 1995 Paper

Fluorescence scanning near-field optical microscopy in reflection

Alain Jalocha, Marco Moers, Niko van Hulst

Proceedings Volume 2535, (1995) https://doi.org/10.1117/12.218694

KEYWORDS: Luminescence, Near field scanning optical microscopy, Polarization, Near field optics, Glasses, Reflection, Polymers, Optical microscopy, Aluminum, Absorption

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Proceedings Article | 6 September 1995 Paper

Biological applications of near-field scanning optical microscopy

Marco Moers, A. Ruiter, Alain Jalocha, Niko van Hulst, W. Kalle, J. Wiegant, A. Raap

Proceedings Volume 2535, (1995) https://doi.org/10.1117/12.218686

KEYWORDS: Luminescence, Near field scanning optical microscopy, Near field optics, Near field, Optical fibers, Image filtering, Diffraction, Optical microscopy, Microscopy, Biomedical optics

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Proceedings Article | 6 September 1995 Paper

Probing field distributions on waveguide structures with an atomic force/photon scanning tunneling microscope

E. Borgonjen, Marco Moers, A. Ruiter, Niko van Hulst

Proceedings Volume 2535, (1995) https://doi.org/10.1117/12.218697

KEYWORDS: Waveguides, Integrated optics, Scanning tunneling microscopy, Near field optics, Atomic force microscopy, Head, Time multiplexed optical shutter, Photonic microstructures, Microfabrication, Silicon

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Proceedings Article | 1 May 1992 Paper

Operation of a scanning near-field optical microscope in reflection in combination with a scanning force microscope

Niko van Hulst, Marco Moers, Oscar Noordman, T. Faulkner, F. Segerink, Kees van der Werf, Bart de Grooth, Bouwe Bolger

Proceedings Volume 1639, (1992) https://doi.org/10.1117/12.58190

KEYWORDS: Near field scanning optical microscopy, Microscopes, Near field optics, Atomic force microscopy, Reflection, Optical microscopes, Scanning probe microscopy, Compact discs, Semiconductor lasers, Image resolution

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Showing 5 of 10 publications

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