Mari Nozoe
at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Metrology, Detection and tracking algorithms, Sensors, Image segmentation, Image processing, Error analysis, Scanning electron microscopy, Measurement devices, Semiconducting wafers, Overlay metrology

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Defect detection, Sensors, Image processing, Inspection, Image resolution, Scanning electron microscopy, Image sensors, Bridges, Defect inspection

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Signal to noise ratio, Defect detection, Image processing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 29 March 2011 Paper
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Multilayers, Defect detection, Inspection, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 12 publications
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