Mr. Maria J. Cadena Profile

Maria J. Cadena

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Proceedings Article | 23 August 2021 Paper

Advanced AFM nanomachining: high aspect repairs

Maria Cadena, Tod Robinson, Marty Klos

Proceedings Volume 11908, 1190803 (2021) https://doi.org/10.1117/12.2601389

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Progress is aggressively being made to advance nanomachining photomask repair technology to the next level of performance. This next level would allow for the dimensional modification of surfaces using diamond AFM tips (NanoBits) with nominal aspect ratios (AR’s) greater than or equal to 1.3 (including 1.8) in the smallest features in production. Prior work along these lines will be presented with new results from a novel process with comparison to established nanomachining processes. These results will evaluate test repairs on the most advanced photomasks currently in production including OMOG and EUV.

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