Dr. Mark A. Crowder Profile

Dr. Mark A. Crowder

at Sharp Labs of America Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 16 May 2003 Paper

Low temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications

Pooran Joshi, M. Moriguchi, Mark Crowder, Steven Droes, James Flores, Apostolos Voutsas, John Hartzell

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482597

KEYWORDS: Thin films, Oxides, Dielectrics, Capacitors, Refractive index, Thin film devices, Plasma, Plasma enhanced chemical vapor deposition, Molybdenum, Thin film deposition

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Proceedings Article | 16 May 2003 Paper

TFT threshold voltage adjustment with in-situ doped PVD silicon films

Steven Droes, Mikel Atkinson, Patrick Guthrie, Mark Crowder, Apostolos Voutsas

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482596

KEYWORDS: Plasma enhanced chemical vapor deposition, Doping, Amorphous silicon, Boron, Silicon films, Laser crystals, Silicon, Sputter deposition, Crystals, Semiconducting wafers

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Proceedings Article | 16 May 2003 Paper

N-shot SLS-processed polycrystalline silicon TFTs

Mark Crowder, M. Moriguchi, Y. Mitani, Apostolos Voutsas

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482589

KEYWORDS: Crystals, Laser sintering, Silicon, Solids, Laser crystals, Thin films, Amorphous silicon, Scanning electron microscopy, Measurement devices, Transistors

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Proceedings Article | 16 May 2003 Paper

Location-controlled crystallization of Si films for TFT circuitapplications

Mark Crowder, Apostolos Voutsas, Steven Droes, M. Moriguchi, Y. Mitani

Proceedings Volume 5004, (2003) https://doi.org/10.1117/12.482592

KEYWORDS: Crystals, Silicon, Laser sintering, Oscillators, Solids, Surface roughness, Microelectronics, Thin films, Transistors, Integrated circuit design

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