Mark Ignatowicz
Engineering Training Coordinator at JSR Micro Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Oxides, Thin films, Lithography, Etching, Dielectrics, Silicon, Scanning electron microscopy, Photomasks, Reactive ion etching, Photoresist processing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top