Dr. Mark A. Lavin Profile

Dr. Mark A. Lavin

Research Staff Member at IBM Thomas J Watson Research Ctr

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Author

Publications (6)

Proceedings Article | 12 May 2005 Paper

The problem of optimal placement of sub-resolution assist features (SRAF)

Maharaj Mukherjee, Scott Mansfield, Lars Liebmann, Alexey Lvov, Evanthia Papadapoulou, Mark Lavin, Zengqin Zhao

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599884

KEYWORDS: SRAF, Photomasks, Manufacturing, Lithography, Resolution enhancement technologies, Spatial frequencies, Optical proximity correction, Algorithms, Printing, Very large scale integration

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Proceedings Article | 5 May 2005 Paper

Integrating DfM components into a cohesive design-to-silicon solution

Lars Liebmann, Dan Maynard, Kevin McCullen, Nakgeuon Seong, Ed Buturla, Mark Lavin, Jason Hibbeler

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604723

KEYWORDS: Design for manufacturing, Resolution enhancement technologies, Manufacturing, Lithography, Model-based design, Optimization (mathematics), Yield improvement, Optical lithography, Diffusion, Optical proximity correction

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Proceedings Article | 3 May 2004 Paper

Merits of cellwise model-based OPC

Puneet Gupta, Fook-Luen Heng, Mark Lavin

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.535852

KEYWORDS: Optical proximity correction, Model-based design, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Lithography, Optical lithography, Diffusion, Performance modeling, Data modeling

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Proceedings Article | 30 July 2002 Paper

Subresolution assist feature implementation for high-performance logic gate-level lithography

Allen Gabor, James Bruce, William Chu, Richard Ferguson, Carlos Fonseca, Ronald Gordon, Kenneth Jantzen, Mukesh Khare, Mark Lavin, Woo-Hyeong Lee, Lars Liebmann, Karl Muller, Jed Rankin, Patrick Varekamp, Franz Zach

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474591

KEYWORDS: SRAF, Optical proximity correction, Logic, Binary data, Lithography, Model-based design, Image enhancement, Printing, Manufacturing, Lithographic illumination

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Proceedings Article | 7 December 1994 Paper

Optical proximity correction: a first look at manufacturability

Lars Liebmann, Brian Grenon, Mark Lavin, Stephen Schomody, Thomas Zell

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195818

KEYWORDS: Computer aided design, Optical proximity correction, Photomasks, Manufacturing, Etching, Optics manufacturing, Ions, Reactive ion etching, Inspection, Semiconducting wafers

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Proceedings Article | 1 July 1991 Paper

Object-oriented language for image and vision execution

Myron Flickner, Mark Lavin, Sujata Das

Proceedings Volume 1568, (1991) https://doi.org/10.1117/12.49888

KEYWORDS: Image processing, Machine vision, Data modeling, Image segmentation, Computer architecture, Computer programming, Mathematical modeling, Image processing software, Algorithm development, Computer programming languages

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Showing 5 of 6 publications

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