Dr. Mark A. Lavin
Research Staff Member at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: SRAF, Photomasks, Manufacturing, Lithography, Resolution enhancement technologies, Spatial frequencies, Optical proximity correction, Algorithms, Printing, Very large scale integration

Proceedings Article | 5 May 2005 Paper
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Design for manufacturing, Resolution enhancement technologies, Manufacturing, Lithography, Model-based design, Optimization (mathematics), Yield improvement, Optical lithography, Diffusion, Optical proximity correction

Proceedings Article | 3 May 2004 Paper
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Optical proximity correction, Model-based design, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Lithography, Optical lithography, Diffusion, Performance modeling, Data modeling

Proceedings Article | 30 July 2002 Paper
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: SRAF, Optical proximity correction, Logic, Binary data, Lithography, Model-based design, Image enhancement, Printing, Manufacturing, Lithographic illumination

Proceedings Article | 7 December 1994 Paper
Proc. SPIE. 2322, 14th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Computer aided design, Optical proximity correction, Photomasks, Manufacturing, Etching, Optics manufacturing, Ions, Reactive ion etching, Inspection, Semiconducting wafers

Showing 5 of 6 publications
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