Dr. Mark C. Phillips Profile

Dr. Mark C. Phillips

Intel Fellow Director of Lithography Hardware Solutions at Intel Corp

SPIE Involvement:

Author | Editor

Proceedings Article | 13 November 2024 Open Access

Exposure tool and ecosystem status for 0.55NA EUV lithography

Mark Phillips

Proceedings Volume 13216, 1321602 (2024) https://doi.org/10.1117/12.3039295

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Proceedings Article | 27 April 2023 Presentation + Paper

Soft x-ray: novel metrology for 3D profilometry and device pitch overlay

Christina Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar el Gawhary, Simon Mathijssen, Peter Engblom, Heidi Chin, William Blanton, Sury Ganesan, Brian Krist, Florian Gstrein, Mark Phillips

Proceedings Volume 12496, 124961I (2023) https://doi.org/10.1117/12.2658495

KEYWORDS: Etching, Metrology, Overlay metrology, Signal detection, Diffraction, Semiconducting wafers, 3D metrology, X-rays, Nanosheets, Scatterometry

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Proceedings Article | 13 June 2022 Presentation

0.55NA EUV progress towards production in 2025

Mark Phillips

Proceedings Volume PC12051, PC1205101 (2022) https://doi.org/10.1117/12.2622177

KEYWORDS: Extreme ultraviolet, Semiconductors, Extreme ultraviolet lithography, Ecosystems

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Proceedings Article | 17 October 2019 Open Access

EUV Extendibility at 0.33 and 0.55NA (Conference Presentation)

Mark Phillips

Proceedings Volume 11147, 1114702 (2019) https://doi.org/10.1117/12.2548654

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Proceedings Article | 18 March 2016 Open Access

EUV progress toward HVM readiness

Britt Turkot, Steven Carson, Anna Lio, Ted Liang, Mark Phillips, Brian McCool, Eric Stenehjem, Tim Crimmins, Guojing Zhang, Sam Sivakumar

Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014

KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

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Proceedings Article | 21 March 2006 Paper

Advances in imaging tool adjustment optimization methodologies and capabilities, including impact upon imaging performance budget components

Steve Slonaker, Mark Phillips, Chris Treadway, Greg Darby, Kurt Johnson, Bob Moore

Proceedings Volume 6154, 615442 (2006) https://doi.org/10.1117/12.659285

KEYWORDS: Distortion, Optimization (mathematics), Semiconducting wafers, Critical dimension metrology, Reticles, Monochromatic aberrations, Overlay metrology, Wavefronts, Optical lithography, Metrology

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Proceedings Article | 12 May 2005 Paper

Influence of illumination tilt on imaging

Mark Phillips, Steven Slonaker, Chris Treadway, Greg Darby

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606127

KEYWORDS: Fiber optic illuminators, Overlay metrology, Photomasks, Distortion, Diffraction, Semiconducting wafers, Image processing, Critical dimension metrology, Monochromatic aberrations, Wavefronts

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Proceedings Article | 1 October 1990 Paper

Growth of ZnTe and ZnSexTe1-x epilayers and superlattices on GaSb

Mark Phillips, Yasantha Rajakarunanayake, James McCaldin, David Chow, D. Collins, Thomas McGill

Proceedings Volume 1285, (1990) https://doi.org/10.1117/12.20830

KEYWORDS: Superlattices, Gallium antimonide, Luminescence, Gallium arsenide, Semiconductors, Tellurium, Thin films, Semiconducting wafers, Selenium, Indium arsenide

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Proceedings Article | 1 October 1990 Paper

Band alignment of Zn1-xCdxTe/ZnTe and ZnTe1-xSex/ZnTe strained layer superlattices

Yasantha Rajakarunanayake, Mark Phillips, James McCaldin, David Chow, D. Collins, Thomas McGill

Proceedings Volume 1285, (1990) https://doi.org/10.1117/12.20829

KEYWORDS: Superlattices, Luminescence, Semiconductors, Heterojunctions, Stereolithography, Selenium, Optical alignment, Thin films, Excitons, P-type semiconductors

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