Dr. Mark L. Raphaelian Profile

Dr. Mark L. Raphaelian

Principal Scientist at National Security Technologies LLC

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Author

Publications (8)

Proceedings Article | 1 September 2021 Presentation + Paper

The electron detection performance of the “Icarus” hCMOS imaging sensor

M. Dayton, C. Trosseille, Q. Shao, M. Sanchez, L. Claus, M. Raphaelian

Proceedings Volume 11838, 1183812 (2021) https://doi.org/10.1117/12.2594346

KEYWORDS: Sensors, External quantum efficiency, Quantum efficiency, Photodiodes, Silicon, Diagnostics, Cameras, Oscillators, Aluminum, Scanning electron microscopy

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Proceedings Article | 31 August 2015 Paper

Mirrored low-energy channel for the MiniXRD

E. Dutra, L. MacNeil, S. Compton, B. Jacoby, M. Raphaelian

Proceedings Volume 9591, 959108 (2015) https://doi.org/10.1117/12.2188709

KEYWORDS: X-rays, Mirrors, Data modeling, Reflectivity, Nickel, Copper, Fusion energy, Diodes, Aluminum, Silver

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Proceedings Article | 27 August 2015 Paper

Stacked, filtered multi-channel X-ray diode array

L. MacNeil, E. Dutra, S. Compton, B. Jacoby, M. Raphaelian

Proceedings Volume 9595, 95950N (2015) https://doi.org/10.1117/12.2189117

KEYWORDS: Diodes, X-rays, Semiconductor lasers, Pulsed laser operation, Optical filters, Laser development, Electrons, Metals, Performance modeling, Diagnostics

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Proceedings Article | 6 May 2005 Paper

Indium tin oxide template development for step and flash imprint lithography

Kathleen Gehoski, Douglas Resnick, William Dauksher, Kevin Nordquist, Eric Ainley, Mark McCord, Mark Raphaelian, Harald Hess

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.606102

KEYWORDS: Chromium, Inspection, Etching, Lithography, Electron beams, Oxides, Indium, Tin, Quartz, Electron beam lithography

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Proceedings Article | 1 September 1998 Paper

Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

Mark Raphaelian, J. David Casey, Andrew Doyle, David Ferranti, John Morgan

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328841

KEYWORDS: Photomasks, Ions, Ion beams, Gallium, Opacity, Electrons, Deep ultraviolet, Phase shifts, Image transmission, Phase shifting

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Proceedings Article | 28 July 1997 Paper

0.35-um i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology

Mark Raphaelian, M. Ellis, David Ferranti, Diane Stewart

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277283

KEYWORDS: Photomasks, Opacity, Phase shifts, Ions, Etching, Ion beams, Binary data, Inspection, Semiconducting wafers, Quartz

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Proceedings Article | 12 February 1997 Paper

Chemically enhanced FIB repair of opaque defects on molybdenum silicide photomasks

J. David Casey, Andrew Doyle, Diane Stewart, David Ferranti, Mark Raphaelian, John Morgan

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301221

KEYWORDS: Quartz, Opacity, Photomasks, Gallium, Etching, Molybdenum, Chemical reactions, Carbon, Deep ultraviolet, Lithography

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Proceedings Article | 12 February 1997 Paper

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

Mark Raphaelian, Don Carolan, J. David Casey, Andrew Doyle, M. Ellis, David Ferranti, Joshua Lessing, K. Rose, Diane Stewart, Roy White

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301220

KEYWORDS: Photomasks, Opacity, Carbon, Calibration, Ion beams, Statistical analysis, Standards development, Semiconducting wafers, Phase shifting, Phase shifts

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Showing 5 of 8 publications

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