Mark C. Simmons
Sr. Product Marketing Manager at ASML Silicon Valley
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Time metrology, Neural networks, Optical proximity correction, Semiconducting wafers, Instrument modeling

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Visualization, Manufacturing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, Back end of line, Front end of line, Design for manufacturability

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Semiconductors, Visualization, Ions, Manufacturing, Photomasks, Semiconductor manufacturing, Optical proximity correction, Neodymium, Algorithm development, Design for manufacturability

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Etching, Photomasks, Machine learning, Image classification, Double patterning technology, Critical dimension metrology, Optimization (mathematics)

Proceedings Article | 19 May 2011 Paper
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Optical lithography, Visualization, Databases, Silicon, Scanning electron microscopy, Nonlinear optics, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 11 publications
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