Dr. Mark D. Smith
Research Scientist at KLA-Tencor Corp
SPIE Involvement:
Author | Instructor
Publications (78)

Proceedings Article | 30 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Overlay metrology, Line edge roughness, Lithography, Stochastic processes, Process control, Manufacturing, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Line width roughness, Extreme ultraviolet lithography, Image segmentation, Scanning electron microscopy

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Process control, Optical lithography, Semiconductor manufacturing, Control systems, Inspection, Tolerancing, Manufacturing, Seaborgium, Semiconductors, Optical alignment, Principal component analysis

Proceedings Article | 3 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithographic illumination, Nanoimprint lithography, Reticles, Optical lithography, Lithography, Scanners, Code division multiplexing, Artificial intelligence, Diffraction, Photomasks

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Overlay metrology, Metrology, Lithography, Scanners, Lithographic illumination, Personal protective equipment, Optical lithography, Resolution enhancement technologies, Optical proximity correction, Photomasks, SRAF

Showing 5 of 78 publications
Course Instructor
SC102: Optical Lithography Modeling
This course presents the theory and applications of optical lithography simulation tools. Using examples, practical applications to typical material and image problems will be discussed.
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