Mr. Mark Thirsk Profile

Mark Thirsk

Managing Partner at Linx Consulting Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 15 September 1993 Paper

Simulation of spray/puddle resist development

Stewart Robertson, J. Tom Stevenson, Robert Holwill, Steven Hansen, Rodney Hurditch, Mark Thirsk, Ivan Daraktchiev

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154750

KEYWORDS: Microelectronics, Lithography, Electroluminescence, Microfabrication, Photoresist developing, Photomasks, Picture Archiving and Communication System, Photoresist processing, Electrical engineering, Optical lithography

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Proceedings Article | 1 June 1992 Paper

Pattern transfer capabilities of CAMP deep-UV resist

Ivan Daraktchiev, Dirk Goossens, P. Matthijs, Mark Thirsk, Andrew Blakeney, Omkaram Nalamasu, May Cheng

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59748

KEYWORDS: Etching, Plasma, Dry etching, Deep ultraviolet, Plasma etching, Photoresist processing, Semiconducting wafers, Lithography, Scanning electron microscopy, Optical lithography

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Proceedings Article | 1 June 1992 Paper

Modeling of postexposure bake and surface inhibition effects in positive photoresist using absolute thickness data

Stewart Robertson, J. Tom Stevenson, Robert Holwill, Steven Hansen, Charles Ebersole, Mark Thirsk, Ivan Daraktchiev

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59747

KEYWORDS: Picture Archiving and Communication System, Diffusion, Semiconducting wafers, Data modeling, Photoresist processing, Systems modeling, Modeling, Photoresist materials, Lithography, Photoresist developing

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Proceedings Article | 1 July 1991 Paper

Photoresist dissolution rates: a comparison of puddle, spray, and immersion processes

Stewart Robertson, J. Tom Stevenson, Robert Holwill, Mark Thirsk, Ivan Daraktchiev, Steven Hansen

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44438

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Inspection, Photoresist materials, Data modeling, Integrated circuits, Metrology, Process control, Refractive index, Reflection

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