Mark E. Yelverton
Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Optical lithography, Data modeling, Scanners, Error analysis, Control systems, Atomic force microscopy, Process control, Semiconducting wafers, Statistical modeling, Overlay metrology

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Statistical analysis, Databases, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Algorithm development, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Etching, Scanners, Scatterometry, Finite element methods, Factory automation, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Logic, Annealing, Laser processing, Distortion, Transistors, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 10 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Metrology, Scanners, Scatterometry, Process control, Finite element methods, Factory automation, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Showing 5 of 6 publications
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