Dr. Marko Chew Profile

Dr. Marko Chew

Technical Marketing Engineer at Siemens EDA

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Publications (5)

Proceedings Article | 21 November 2023 Presentation + Paper

Machine learning assisted effective OPC verification hotspot capture

Lianghong Yin, Marko Chew, Shumay Shang, Le Hong, Fan Jiang, Ilhami Torunoglu

Proceedings Volume 12751, 127510W (2023) https://doi.org/10.1117/12.2687752

KEYWORDS: Optical proximity correction, Image classification, Design and modelling, Machine learning, Data modeling, Critical dimension metrology, Tunable filters, Scanning electron microscopy, Inspection

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Proceedings Article | 22 February 2021 Presentation + Paper

Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics

Azat Latypov, Gurdaman Khaira, Germain Fenger, Shuling Wang, Marko Chew, Shumay Shang

Proceedings Volume 11609, 1160917 (2021) https://doi.org/10.1117/12.2583792

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Proceedings Article | 20 March 2020 Presentation + Paper

Real-time full-wafer design-based inter-layer virtual metrology

Lianghong Yin, John Sturtevant, Alberto Lopez Gomez, Shumay Shang, Young Chang Kim, Kostas Adam, Marko Chew, Abhinandan Nath, Boris Habets, Manuela Gutsch, Philip Groeger

Proceedings Volume 11325, 1132507 (2020) https://doi.org/10.1117/12.2551082

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Metals, Metrology, Critical dimension metrology, Databases, Inspection, Computer simulations, Scanners

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Proceedings Article | 23 September 2009 Paper

Model-based hints for litho-hotspots repair

Yue Yang, Marko Chew, Toshikazu Endo, Mark Simmons

Proceedings Volume 7488, 74883O (2009) https://doi.org/10.1117/12.829726

KEYWORDS: Model-based design, Resolution enhancement technologies, Lithography, Visualization, Photovoltaics, Optical components, Geometrical optics, Distributed computing, Photomasks, Integrated circuit design

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Proceedings Article | 23 September 2009 Paper

pRSM: models for model-based litho-hotspot repairs

Marko Chew, Toshikazu Endo, Yue Yang

Proceedings Volume 7488, 74883L (2009) https://doi.org/10.1117/12.829723

KEYWORDS: Data modeling, Error analysis, Model-based design, Calibration, Resolution enhancement technologies, Statistical modeling, Raster graphics, Lithography, Optical proximity correction, Visualization

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