Dr. Marko Vogler Profile

Dr. Marko Vogler

at micro resist technology GmbH

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Author

Publications (8)

Proceedings Article | 3 April 2015 Paper

Towards high precision manufacturing of 3D optical components using UV-curable hybrid polymers

A. Schleunitz, J. Klein, R. Houbertz, M. Vogler, G. Gruetzner

Proceedings Volume 9368, 93680E (2015) https://doi.org/10.1117/12.2076252

KEYWORDS: Polymers, Optics manufacturing, Waveguides, Lithography, Microlens, Optical components, Optical interconnects, Manufacturing, Ultraviolet radiation, Nanoimprint lithography

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SPIE Journal Paper | 21 October 2014

Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Manuel Thesen, Dieter Nees, Stephan Ruttloff, Maximilian Rumler, Mathias Rommel, Florian Schlachter, Susanne Grützner, Marko Vogler, Arne Schleunitz, Gabi Grützner

JM3, Vol. 13, Issue 04, 043003, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043003

KEYWORDS: Nanoimprint lithography, Etching, Silicon, Dry etching, Polymers, Photoresist processing, Nickel, Inkjet technology, Nanostructures, Reactive ion etching

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SPIE Journal Paper | 5 September 2014

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Giuseppe Calafiore, Scott Dhuey, Simone Sassolini, Nerea Alayo, David Gosselin, Marko Vogler, Deidre Olynick, Christophe Peroz, Stefano Cabrini

JM3, Vol. 13, Issue 03, 033013, (September 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033013

KEYWORDS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy

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Proceedings Article | 28 March 2014 Paper

Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Manuel Thesen, Maximilian Rumler, Florian Schlachter, Susanne Grützner, Christian Moormann, Mathias Rommel, Dieter Nees, Stephan Ruttloff, Stefan Pfirrmann, Marko Vogler, Arne Schleunitz, Gabi Grützner

Proceedings Volume 9049, 90490H (2014) https://doi.org/10.1117/12.2046279

KEYWORDS: Nanoimprint lithography, Etching, Dry etching, Silicon, Photoresist processing, Positron emission tomography, Surface roughness, Semiconducting wafers, Nanostructures, Refractive index

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Proceedings Article | 7 March 2014 Paper

UV-curable hybrid polymers for optical applications: technical challenges, industrial solutions, and future developments

G. Gruetzner, J. Klein, M. Vogler, A. Schleunitz

Proceedings Volume 8974, 897406 (2014) https://doi.org/10.1117/12.2043038

KEYWORDS: Polymers, Ultraviolet radiation, Refractive index, Nanofabrication, Lithography, Transmittance, Optical lithography, Carbon dioxide, UV optics, Optics manufacturing

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Proceedings Article | 2 May 2008 Paper

Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials

Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner

Proceedings Volume 6792, 67920J (2008) https://doi.org/10.1117/12.798602

KEYWORDS: Polymers, Silicon, Ultraviolet radiation, Nanoimprint lithography, Lithography, Sol-gels, Transparency, Coating, Glasses, Quartz

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Proceedings Article | 21 March 2007 Paper

Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing

Marko Vogler, Markus Bender, Ulrich Plachetka, Andreas Fuchs, Sabine Wiedenberg, Freimut Reuther, Gabi Grützner, Heinrich Kurz

Proceedings Volume 6517, 651727 (2007) https://doi.org/10.1117/12.708507

KEYWORDS: Polymers, Ultraviolet radiation, Etching, Silicon, Plasma, Oxygen, Plasma etching, Nanoimprint lithography, Polymerization, Lithium

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Proceedings Article | 6 May 2005 Paper

Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Freimut Reuther, Mike Kubenz, Christine Schuster, Marion Fink, Marko Vogler, Gabi Gruetzner, Juergen Grimm, Andi Kaeppel

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600851

KEYWORDS: Polymers, Nanoimprint lithography, Photoresist processing, Annealing, Polymerization, Glasses, Semiconducting wafers, Polymethylmethacrylate, Solids, Distortion

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Showing 5 of 8 publications

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