Dr. Markus R. Weiss
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 9 November 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Metrology, Calibration, Image processing, Scanners, Image acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Metrology, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Prototyping, EUV optics

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

Proceedings Article | 24 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, System integration, Prototyping

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

Showing 5 of 14 publications
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