Dr. Markus R. Weiss Profile

Dr. Markus R. Weiss

at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 9 November 2015 Paper

Actinic review of EUV masks: status and recent results of the AIMS EUV system

Sascha Perlitz, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg, Renzo Capelli, Krister Magnusson, Matt Malloy, Stefan Wurm

Proc. SPIE. 9635, Photomask Technology 2015

KEYWORDS: Metrology, Calibration, Image processing, Scanners, Image acquisition, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

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Proceedings Article | 16 March 2015 Paper

Actinic review of EUV masks: Status and recent results of the AIMS EUV system

Markus Weiss, Dirk Hellweg, Markus Koch, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Krister Magnusson, Renzo Capelli, Vibhu Jindal

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Metrology, Imaging systems, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Prototyping, EUV optics

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Proceedings Article | 29 October 2014 Paper

AIMS EUV first light imaging performance

Anthony Garetto, Renzo Capelli, Krister Magnusson, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss, Michael Goldstein

Proc. SPIE. 9235, Photomask Technology 2014

KEYWORDS: Logic, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

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Proceedings Article | 24 April 2014 Paper

Actinic review of EUV masks: first results from the AIMS EUV system integration

Markus Weiss, Dirk Hellweg, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Michael Goldstein

Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V

KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, System integration, Prototyping

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Proceedings Article | 1 October 2013 Paper

Status of the AIMS EUV development project

Anthony Garetto, Jan Hendrik Peters, Dirk Hellweg, Markus Weiss

Proc. SPIE. 8886, 29th European Mask and Lithography Conference

KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

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Proceedings Article | 8 November 2012 Paper

Status of the AIMS(TM) EUV Project

Anthony Garetto, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Metrology, Scanners, Particles, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Climatology, Prototyping

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Proceedings Article | 23 March 2012 Paper

Closing the infrastructure gap: status of the AIMS EUV project

Dirk Hellweg, Markus Weiss, Sascha Perlitz, Jan Hendrik Peters, Wolfgang Harnisch, Michael Goldstein

Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III

KEYWORDS: Mirrors, Multilayers, Metrology, Scanners, Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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Proceedings Article | 14 October 2011 Paper

Development status and infrastructure progress update of aerial imaging measurements on EUV masks

Sascha Perlitz, Wolfgang Harnisch, Ulrich Strößner, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg

Proc. SPIE. 8166, Photomask Technology 2011

KEYWORDS: Electron beam lithography, Light sources, Metrology, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Airborne remote sensing, EUV optics, Plasma

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Proceedings Article | 16 June 2003 Paper

EUV time-resolved studies on carbon growth and cleaning

Bas Mertens, Bas Wolschrijn, Rik Jansen, Norbert Koster, Markus Weiss, Marco Wedowski, Roman Klein, Thomas Bock, Reiner Thornagel

Proc. SPIE. 5037, Emerging Lithographic Technologies VII

KEYWORDS: Carbon, Mirrors, Contamination, Reflection, Reflectivity, Oxygen, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

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Proceedings Article | 3 November 1997 Paper

Optimization of a spectromicroscopy beamline at BESSY II

Christian Jung, Johannes Bahrdt, Uwe Flechsig, Markus Weiss

Proc. SPIE. 3150, Gratings and Grating Monochromators for Synchrotron Radiation

KEYWORDS: Optical components, Microscopes, Mirrors, Dispersion, Microscopy, Ray tracing, Synchrotrons, Spatial resolution, Synchrotron radiation, Monochromators

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Proceedings Article | 11 November 1994 Paper

Grazing incidence mirror for a new microspectroscope using soft x-ray undulator radiation

Markus Weiss, V. Wuestenhagen, E. Umbach

Proc. SPIE. 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics

KEYWORDS: Diffraction, Mirrors, Spatial frequencies, Scattering, X-rays, Manufacturing, Ray tracing, Spatial resolution, Grazing incidence, Optics manufacturing

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SPIE Journal Paper | 1 April 1991

Autocorrelation via two-wave mixing in barium titanate

Markus Weiss, Azad Siahmakoun

OE Vol. 30 Issue 04

KEYWORDS: Crystals, Two wave mixing, Ferroelectric materials, Fourier transforms, Photorefraction, Laser crystals, Nonlinear crystals, Convolution, Image enhancement, Wave propagation

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Proceedings Article | 1 March 1991 Paper

Optical neural networks: an implementation

Azad Siahmakoun, Steven Blair, Markus Weiss

Proc. SPIE. 1396, Applications of Optical Engineering: Proceedings of OE/Midwest '90

KEYWORDS: Prisms, Holograms, Ferroelectric materials, Crystals, Fourier transforms, Neural networks, Binary data, Systems modeling, Content addressable memory, Neurons

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Proceedings Article | 1 July 1990 Paper

Enhancement of fringe visibility by squaring with photorefractive processor

Markus Weiss, Azad Siahmakoun

Proc. SPIE. 1319, Optics in Complex Systems

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Showing 5 of 14 publications

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