Martijn H.A. Leenders
Fellow at ASML Netherlands BV
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 22 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Lithography, Logic, Scanners, Manufacturing, Extreme ultraviolet, Logic devices, High volume manufacturing, Critical dimension metrology, Stochastic processes, Overlay metrology

Proceedings Article | 9 September 2019 Presentation
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Metrology, Optical lithography, Sensors, Calibration, Scanners, Distortion, Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Reticles, Sensors, Scanners, Wavefronts, Control systems, Process control, Optical alignment, Semiconducting wafers, HVAC controls

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Monochromatic aberrations, Polarization, Manufacturing, Double patterning technology, Immersion lithography, Semiconducting wafers, Overlay metrology, Focus stacking software, Combined lens-mirror systems

Showing 5 of 7 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top