Mr. Martin Hofmann Profile

Martin Hofmann

at Technische Univ Ilmenau

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Author

Publications (10)

Proceedings Article | 1 April 2020 Presentation + Paper

Demonstration of aberration-robust high-frequency modulated differential confocal microscopy with an oscillating pinhole

Johannes Belkner, Martin Hofmann, Johannes Kirchner, Eberhard Manske

Proceedings Volume 11352, 113520N (2020) https://doi.org/10.1117/12.2555558

KEYWORDS: Confocal microscopy, Modulation, Objectives, Sensors, Signal to noise ratio, Monochromatic aberrations, Microelectromechanical systems, Signal detection

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Proceedings Article | 23 March 2020 Paper

Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision

Ingo Ortlepp, Michael Kühnel, Martin Hofmann, Laura Weidenfeller, Johannes Kirchner, Shraddha Supreeti, Rostyslav Mastylo, Mathias Holz, Thomas Michels, Roland Füßl, Ivo Rangelow, Thomas Fröhlich, Denis Dontsov, Christoph Schäffel, Eberhard Manske

Proceedings Volume 11324, 113240A (2020) https://doi.org/10.1117/12.2551044

KEYWORDS: Interferometers, Nanofabrication, Mirrors, Actuators, Near field optics, Control systems, Manufacturing, Nanotechnology, Physics, Atomic force microscopy

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Proceedings Article | 26 September 2019 Paper

Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, Ivo Rangelow

Proceedings Volume 11148, 111481F (2019) https://doi.org/10.1117/12.2537018

KEYWORDS: Scanning electron microscopy, Atomic force microscope, Electron microscopes, Metrology, Electron beams, Nanofabrication, Diamond, Scanning probe lithography, Microscopy, Overlay metrology

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Proceedings Article | 26 September 2019 Paper

High throughput AFM inspection system with parallel active cantilevers

M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee

Proceedings Volume 11148, 111481E (2019) https://doi.org/10.1117/12.2537009

KEYWORDS: Inspection, Atomic force microscopy, Chemical mechanical planarization, Actuators, Metrology, Semiconductors, Optical inspection, Charged particle optics, Electron beams, Photomasks

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Proceedings Article | 21 June 2019 Paper

Micro- and nanofabrication technologies using the nanopositioning and nanomeasuring machines

Laura Weidenfeller, Martin Hofmann, Johannes Kirchner, Shraddha Supreeti, Ivo Rangelow, Stefan Sinzinger, Eberhard Manske

Proceedings Volume 11056, 1105637 (2019) https://doi.org/10.1117/12.2528136

KEYWORDS: Lithography, Sensors, Silicon, Nanofabrication, Laser processing, Photoresist materials, Interferometers, Scanning probe lithography, Optical lithography, Absorption

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To keep up with Moore’s law in future, the critical dimensions of device features must further decrease in size. Thus, the nano-electronics and nano-optics manufacturing is based on the ongoing development of the lithography and encompasses also some unconventional methods. In this context, we use the Nanopositioning and Nanomeasuring Machine (NPMM) to generate features in resist layers by means of Direct Laser Writing (DLW),¹ Field Emission Scanning Probe Lithography (FE-SPL)² and Soft UV-Nanoimprint Lithography (Soft UV-NIL)³ with highest accuracy. The NPMM was collaboratively developed by TU Ilmenau and SIOS Meßtechnik GmbH.⁴ The tool provides a large positioning volume of 25 mm × 25 mm × 5 mm with a positioning resolution of 0.1 nm and a repeatability of less than 0.3 nm over the full range. Previously a single electron transistor (SET) working at room temperature generated by FE-SPL has been demonstrated.⁵ However, the throughput is limited because of the serial writing scheme making Tennant’s law (At ∼ R5 ) valid.⁶ Here, At is the areal throughput and R the lithographic resolution. Thus, patterning of the whole NPMM positioning area by FE-SPL is very time consuming. In order to address this problem, different strategies and/or combinations are conceivable. In this work a so-called Mix-and-Match lithography is conducted. A fast generation of structures in the sub-micron range is possible by means of DLW. By this, features such as electrical wires, contact patches for bonding or labels are generated in resist. Subsequently, we use FE-SPL in order to define the actual nano-scaled features for quantum or single electron devices. In combination, DLW and FE-SPL are maskless lithography strategies, hence, offering completely novel opportunities for rapid nanoscale prototyping of largescale resist patterns. An explanation of this technique is given in a previous publication.⁷ Furthermore, after reactive ion etching, the sample can be used as template for Soft UV-NIL, thus resulting in a high-throughput process chain for future quantum and/or single electron devices.

Proceedings Article | 26 March 2019 Paper

Integrated soft UV-nanoimprint lithography in a nanopositioning and nanomeasuring machine for accurate positioning of stamp to substrate

Shraddha Supreeti, Johannes Kirchner, Martin Hofmann, Rostyslav Mastylo, Ivo Rangelow, Eberhard Manske, Martin Hoffmann, Stefan Sinzinger

Proceedings Volume 10958, 1095819 (2019) https://doi.org/10.1117/12.2514832

KEYWORDS: Sensors, Ultraviolet radiation, Nanoimprint lithography, Silicon, Nanostructures, Lithography, Photoresist processing, Scanning electron microscopy, Fabrication, Optical sensors

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Proceedings Article | 4 March 2019 Paper

Laser-microfabrication with accurate positioning and metrological traceability

Laura Weidenfeller, Johannes Kirchner, Martin Hofmann, Michael Kühnel, Carsten Reinhardt, Ivo Rangelow, Eberhard Manske

Proceedings Volume 10930, 109300L (2019) https://doi.org/10.1117/12.2508248

KEYWORDS: Sensors, Multiphoton lithography, Metrology, Two photon polymerization

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Proceedings Article | 19 March 2018 Presentation + Paper

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske

Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955

KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

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Proceedings Article | 19 March 2018 Paper

Fabrication of optical nanodevices through field-emission scanning probe lithography and cryogenic etching

Cemal Aydogan, Martin Hofmann, Claudia Lenk, Burkhard Volland, Ivo Rangelow, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda Yalcinkaya

Proceedings Volume 10584, 105841G (2018) https://doi.org/10.1117/12.2305268

KEYWORDS: Scanning probe lithography, Cryogenics, Etching, Electron beam lithography, Silicon, Lithography, Manufacturing, Split ring resonators, Resonators, Ions

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Proceedings Article | 31 January 2018 Paper

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda Yalcinkaya, Ahmad Ahmad, Alexander Reum, Mathias Holz

Proceedings Volume 10456, 1045621 (2018) https://doi.org/10.1117/12.2282606

KEYWORDS: Lithography, Scanning probe lithography, Cryogenics, Etching, Optics manufacturing, Nanostructures, Nanolithography, Optical lithography, Split ring resonators, Image resolution

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Showing 5 of 10 publications

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