Dr. Martin Eibelhuber Profile

Dr. Martin Eibelhuber

Deputy Business Development at EV Group

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Publications (9)

Proceedings Article | 25 May 2022 Presentation + Paper

Wafer scale nanoimprint lithography: distortion improvement and stabilization

Jerome Reche, Maxime Argoud, Anaïs De Lehelle D'Affroux, Haidar Al Dujaili, Jonas Khan, Sebastian Haumann, Peter Ledel, Martin Eibelhuber

Proceedings Volume 12054, 1205404 (2022) https://doi.org/10.1117/12.2613788

KEYWORDS: Distortion, Semiconducting wafers, Nanoimprint lithography, Overlay metrology, Standards development, Lithography, Data modeling

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Proceedings Article | 20 May 2022 Presentation + Paper

Advanced manufacturing techniques for wafer-level freeform micro optics with high refractive index

A. Kneidinger, P. Schuster, C. Thanner, M. Eibelhuber

Proceedings Volume 12135, 1213509 (2022) https://doi.org/10.1117/12.2632072

KEYWORDS: Refractive index, Nanoimprint lithography, Semiconducting wafers, Micro optics, Manufacturing, Surface roughness, High volume manufacturing, Grayscale lithography

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Proceedings Article | 29 March 2021 Presentation + Paper

Towards AR waveguides with refractive index 2.0 utilizing nanoimprint lithogrpahy

Martin Eibelhuber, Christine Thanner, Dominik Treiblmayr, Sebastien Pochon, W. Frost, Joao Ferreira, David Pearson, Stephanie Baclet

Proceedings Volume 11765, 117650H (2021) https://doi.org/10.1117/12.2579505

KEYWORDS: Refractive index, Augmented reality, Waveguides, Nanoimprint lithography, Etching, Polymers, Glasses, Nanostructures, Photorefractive polymers, Optics manufacturing

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Proceedings Article | 22 February 2021 Presentation + Paper

Integration of sub 50 nm features based on EVG SmartNIL for 8-inch substrates

Jérôme Rêche, Maxime Argoud, Anaïs De Lehelle D'Affroux, Khatia Benotmane, Sebastian Haumann, Jonas Khan, Martin Eibelhuber

Proceedings Volume 11610, 116100C (2021) https://doi.org/10.1117/12.2583631

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Standards development, Scanning electron microscopy, Photoresist processing, Photonics, Optical lithography, Nanotechnology, Metrology, Lithography

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Proceedings Article | 19 February 2020 Paper

Nanoimprint lithography for augmented reality waveguide manufacturing

Christine Thanner, Anna Dudus, Dominik Treiblmayr, G. Berger, M. Chouiki, Stephan Martens, Michael Jurisch, Julian Hartbaum, Martin Eibelhuber

Proceedings Volume 11310, 1131010 (2020) https://doi.org/10.1117/12.2543692

KEYWORDS: Nanoimprint lithography, Manufacturing, Augmented reality, Semiconducting wafers, Waveguides, Optics manufacturing, Electron beam lithography, Polymers, High volume manufacturing, Nanostructures

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Wafer-level nanoimprint lithography (NIL) has increasingly become a key enabling technology to support new devices and applications across a wide range of markets. Leading manufacturers of augmented reality (AR) devices, optical sensors and biomedical chips are already utilizing NIL and realizing the benefits of this technology, including the ability to mass manufacture micro- and nano-scale structures down with a maximum degree of freedom for the device dimensions. Another key advantage of this replication based technology is, given by the fact that even complex structures which require precise and time consuming fabrication methods can be transferred to mass manufacturing in an efficient semiconductor manufacturing line. Additionally, for many devices especially for optical applications the replicated layer can be directly used as functional layer in the product. Today NIL is considered as decisive process step for a number of emerging products, including AR waveguides. With increasing volumes the scaling of the production lines is crucial for most economical implementation of NIL. In particular for scaling to production lines using 200mm or even 300mm wafer sizes, the whole process chain has to be established. This is in particular a focus for AR devices requiring highly complex structures with tight specifications. Thus best efforts for master fabrication are crucial to obtain best performing devices. For smaller substrates, typically full area masters are used to manufactured and used for the NIL process. However, as the masters are mainly fabricated by sequential processes the costs scale with the pattern area. For 200mm and 300mm it has been proven to be viable option to start with single high-quality devices and scale them by step and repeat (SR) NIL to fully populated waferscale masters and subsequently to use those for volume manufacturing on wafer-level. The wafer-level production itself requires then reliable replication of working stamps and wafer level nanoimprinting of these multiple devices on a single wafer. As a result it is key for the high volume manufacturing to have a thorough understanding of all required pattering and replications steps to enable these large area manufacturing lines.

Proceedings Article | 21 March 2017 Paper

Rules-based correction strategies setup on sub-micrometer line and space patterns for 200mm wafer scale SmartNIL process within an integration process flow

H. Teyssedre, S. Landis, P. Brianceau, M. Mayr, C. Thanner, M. Laure, W. Zorbach, M. Eibelhuber, L. Pain, M. Chouiki, M. Wimplinger

Proceedings Volume 10144, 101440V (2017) https://doi.org/10.1117/12.2260002

KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Manufacturing, Critical dimension metrology, Lithography, High volume manufacturing, Calibration, Standards development, Etching, Silicon, Metrology, Scanning electron microscopy

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Proceedings Article | 20 October 2016 Paper

Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification

H. Teyssedre, S. Landis, C. Thanner, V. Schauer, M. Laure, W. Zorbach, L. Pain, S. Bos, M. Eibelhuber, M. Wimplinger

Proceedings Volume 10032, 100320M (2016) https://doi.org/10.1117/12.2250194

KEYWORDS: High volume manufacturing, Nanoimprint lithography, Semiconducting wafers, Critical dimension metrology, Silicon, Ultraviolet radiation, Polymers, Manufacturing, Metrology, Scanning electron microscopy

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Proceedings Article | 25 March 2015 Paper

CMOS compatible fabrication of 3D photonic crystals by nanoimprint lithography

M. Eibelhuber, T. Uhrmann, T. Glinsner

Proceedings Volume 9375, 93750N (2015) https://doi.org/10.1117/12.2084583

KEYWORDS: Photonic crystals, Nanoimprint lithography, Optical alignment, Moire patterns, Lithography, Semiconducting wafers, Crystals, Silicon, Printing, Ultraviolet radiation

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Proceedings Article | 1 February 2008 Paper

Mid-infrared vertical-cavity surface-emitting lasers based on lead salt/BaF2 Bragg mirrors

Martin Eibelhuber, Thomas Schwarzl, Andreas Winter, Harald Pascher, Wolfgang Heiss, Gunther Springholz

Proceedings Volume 6900, 69000E (2008) https://doi.org/10.1117/12.783927

KEYWORDS: Mirrors, Vertical cavity surface emitting lasers, Reflectivity, Refractive index, Optical microcavities, Mid-IR, Continuous wave operation, Absorption, Laser damage threshold, Lead

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Showing 5 of 9 publications

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