Dr. Martin Lowisch Profile

Dr. Martin Lowisch

Deceased at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 17 April 2014 Paper

Paper

EUV lithography: NXE platform performance overview

Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David Brandt, Nigel Farrar, Igor Fomenkov, Herman Boom, Hans Meiling, Ron Kool

Proceedings Volume 9048, 90481J (2014) https://doi.org/10.1117/12.2046909

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Logic, Imaging systems, Scanners, Optical proximity correction, Metrology, Photomasks

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Proceedings Article | 1 April 2013 Paper

Paper

Optics for ASML's NXE:3300B platform

Martin Lowisch, Peter Kuerz, Olaf Conradi, Gero Wittich, Wolfgang Seitz, Winfried Kaiser

Proceedings Volume 8679, 86791H (2013) https://doi.org/10.1117/12.2012158

KEYWORDS: Mirrors, EUV optics, Extreme ultraviolet, Optics manufacturing, Extreme ultraviolet lithography, Coating, Ions, Eye, Reflectivity, Neodymium

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Proceedings Article | 1 April 2013 Paper

Paper

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen, Noreen Harned, Peter Kuerz, Martin Lowisch, Henk Meijer, David Ockwell, Eelco van Setten, Guido Schiffelers, Jan-Willem van der Horst, Judon Stoeldraijer, Robert Kazinczi, Richard Droste, Hans Meiling, Ron Kool

Proceedings Volume 8679, 86791F (2013) https://doi.org/10.1117/12.2010932

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Overlay metrology, Image resolution, Mirrors, Lithography, Wafer-level optics

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Proceedings Article | 23 March 2012 Paper

Paper

From performance validation to volume introduction of ASML's NXE platform

Hans Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kűrz, Martin Lowisch, Henk Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, Ron Kool

Proceedings Volume 8322, 83221G (2012) https://doi.org/10.1117/12.916971

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Scanners, Mirrors, Photomasks, Particles, Overlay metrology, Line width roughness

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Proceedings Article | 7 April 2011 Paper

Paper

EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

Christian Wagner, Jose Bacelar, Noreen Harned, Erik Loopstra, Stef Hendriks, Ivo de Jong, Peter Kuerz, Leon Levasier, Mark van de Kerkhof, Martin Lowisch, Hans Meiling, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Stuart Young, John Zimmerman, Ron Kool

Proceedings Volume 7969, 79691F (2011) https://doi.org/10.1117/12.878603

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Overlay metrology, Optical proximity correction, Manufacturing, Extreme ultraviolet, Contamination, High volume manufacturing, Optics manufacturing

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Proceedings Article | 20 March 2010 Paper

Paper

EUV into production with ASML's NXE platform

Christian Wagner, Noreen Harned, Peter Kuerz, Martin Lowisch, Hans Meiling, David Ockwell, Rudy Peeters, Koen van Ingen-Schenau, Eelco van Setten, Judon Stoeldraijer, Bernd Thuering

Proceedings Volume 7636, 76361H (2010) https://doi.org/10.1117/12.845700

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Reticles, Optics manufacturing, Lithography, System integration, Mirrors, Lithographic illumination, Optical alignment

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Proceedings Article | 18 March 2010 Paper

Paper

Optics for EUV production

Martin Lowisch, Peter Kuerz, Hans-Juergen Mann, Oliver Natt, Bernd Thuering

Proceedings Volume 7636, 763603 (2010) https://doi.org/10.1117/12.848624

KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, EUV optics, Optics manufacturing, Extreme ultraviolet lithography, Reticles, Coating, Wavefronts, Reflectivity

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Proceedings Article | 10 December 2009 Paper

Paper

EUVL: towards implementation in production

Hans Meiling, Nico Buzing, Kevin Cummings, Noreen Harned, Bas Hultermans, Roel De Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Christian Wagner, Andre Van Dijk, Eelco Van Setten, John Zimmerman, Peter Cheang, Alek Chen

Proceedings Volume 7520, 752008 (2009) https://doi.org/10.1117/12.845781

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Optics manufacturing, Lithography, Plasma, Tin

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SPIE Journal Paper | 1 October 2009

Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnermeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steven Hansen

JM3, Vol. 8, Issue 04, 041509, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238543

KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

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Proceedings Article | 18 March 2009 Paper

Paper

Imaging budgets for EUV optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnemeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steve Hansen

Proceedings Volume 7271, 72711B (2009) https://doi.org/10.1117/12.814185

KEYWORDS: Extreme ultraviolet, EUV optics, Nanoimprint lithography, Fiber optic illuminators, Critical dimension metrology, Optics manufacturing, Lithography, Optical proximity correction, Image processing, Solids

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Proceedings Article | 18 March 2009 Open Access

Open Access

Paper

EUVL system: moving towards production

Hans Meiling, Nico Buzing, Kevin Cummings, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Christian Wagner, Andre van Dijk, Eelco van Setten, John Zimmerman

Proceedings Volume 7271, 727102 (2009) https://doi.org/10.1117/12.814041

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Semiconducting wafers, Mirrors, Reticles, Tin, Reflectivity, Plasma, Lithography

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Proceedings Article | 21 March 2008 Paper

Paper

Performance of the full field EUV systems

Hans Meiling, Edwin Boon, Nico Buzing, Kevin Cummings, Olav Frijns, Judy Galloway, Mieke Goethals, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Kurt Ronse, James Ryan, Emil Smitt-Weaver, Michael Tittnich, Christian Wagner, Andre van Dijk, John Zimmerman

Proceedings Volume 6921, 69210L (2008) https://doi.org/10.1117/12.773259

KEYWORDS: Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Semiconducting wafers, Mirrors, Printing, Sensors, Stray light, Cameras, Reticles

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Proceedings Article | 13 March 2007 Paper

Paper

EUV lithography with the Alpha Demo Tools: status and challenges

Noreen Harned, Mieke Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, Henk Meijer, Hans Meiling, Kurt Ronse, James Ryan, Michael Tittnich, Harm-Jan Voorma, John Zimmerman, Uwe Mickan, Sjoerd Lok

Proceedings Volume 6517, 651706 (2007) https://doi.org/10.1117/12.712065

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Photomasks, Reflectivity, Tin, Reliability

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Proceedings Article | 20 May 2004 Paper

Paper

EUV imaging: an aerial image study

Martin Lowisch, Udo Dinger, Uwe Mickan, Tilmann Heil

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537338

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Electroluminescence, Reticles, Nanoimprint lithography, Lithography, Diffraction, Critical dimension metrology, Photomasks, Imaging systems

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Proceedings Article | 26 June 2003 Paper

Paper

Impact of wavefront errors on low k1 processes at extremely high NA

Paul Graeupner, Reiner Garreis, Aksel Goehnermeier, Tilmann Heil, Martin Lowisch, Donis Flagello

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.482694

KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Lithography, Wavefronts, Lawrencium, Spherical lenses, Wavefront aberrations, Zernike polynomials, Systems modeling, 193nm lithography

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Proceedings Article | 30 July 2002 Paper

Paper

Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner Garreis, Donis Flagello, Steven Hansen, Robert Socha, Carsten Koehler

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474569

KEYWORDS: Photomasks, Printing, Nanoimprint lithography, Image processing, Lithography, Image filtering, Reticles, Binary data, Monochromatic aberrations, Electroluminescence

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Proceedings Article | 6 June 1997 Paper

Paper

Self-assembled visible-bandgap II-VI quantum dots

Martin Lowisch, Michael Rabe, B. Stegemann, Fritz Henneberger

Proceedings Volume 2994, (1997) https://doi.org/10.1117/12.275576

KEYWORDS: Quantum dots, Excitons, Phonons, Luminescence, Cadmium, Molecular self-assembly, Quantum wells, Transmission electron microscopy, Molecular beam epitaxy, Semiconductors

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Proceedings Article | 1 May 1996 Paper

Paper

Excitons, biexcitons, and stimulated emission in wide gap II-VI quantum wells

Fritz Henneberger, Joachim Puls, T. Hauepl, Frank Kreller, Martin Lowisch, H. Nickolaus, Alex Schuelzgen, Hans-Juergen Wuensche, J. Griesche, Nir Hoffman, Michael Rabe

Proceedings Volume 2693, (1996) https://doi.org/10.1117/12.238957

KEYWORDS: Excitons, Quantum wells, Picosecond phenomena, Absorption, Cadmium, Temperature metrology, Scattering, Geometrical optics, Semiconductor lasers, Plasma

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Showing 5 of 18 publications

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