Martin E. Mastovich
at Inspectrology LLC
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Photomasks, Cadmium sulfide, Semiconducting wafers, Spiral phase plates, Critical dimension metrology, Optical vortices, Distortion, Optical lithography, Phase shifts, Scanning electron microscopy

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Metrology, Lithography, Electron beams, Chemical analysis, 193nm lithography, Temperature metrology

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Metrology, Databases, Data communications, Diagnostics, Process control, Computer security, Image quality, Scanning electron microscopy, Pattern recognition, Internet

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Metrology, Electron beams, Data modeling, Contamination, Semiconducting wafers, Systems modeling, Process control

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Line edge roughness, Electron beams, Metrology, Critical dimension metrology, Diffractive optical elements, Image acquisition, Transistors, Process control, Scanning electron microscopy, Semiconducting wafers

Showing 5 of 11 publications
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