Dr. Martin Schulz
Senior Staff R&D Engineer at Synopsys GmbH
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Modulation, Backscatter, Metals, Ions, Scanning electron microscopy, Image quality, Photomasks, Line width roughness, Acquisition tracking and pointing, Nanoimprint lithography

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electron beam lithography, Data modeling, Scattering, Calibration, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Photoresist processing, Process modeling, Chemically amplified resists

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Point spread functions, Cadmium, Data modeling, Error analysis, 3D modeling, Critical dimension metrology, Geometrical optics, Virtual reality, Electron beam direct write lithography, Model-based design

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Scattering, Fourier transforms, Monte Carlo methods, Optical simulations, Photoresist processing, Semiconducting wafers, Stochastic processes

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