Dr. Martin Sczyrba
at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Etching, Manufacturing, Quality measurement, Scanning electron microscopy, Photomasks, Machine learning, Convolution, Critical dimension metrology, Environmental sensing

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers, Performance modeling

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Detection and tracking algorithms, Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Reticles, Scattering, Scanners, Light scattering, Photomasks, Logic devices, Source mask optimization

Proceedings Article | 9 November 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Refractive index, Finite-difference time-domain method, Deep ultraviolet, Silica, Polarization, Opacity, Phase shift keying, Near field, Photomasks, Phase measurement, Critical dimension metrology, Panoramic photography, Semiconducting wafers, Binary data, Airborne remote sensing, 193nm lithography, Absorption

Showing 5 of 29 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top