Mr. Masaharu Fukuda Profile

Masaharu Fukuda

at Dai Nippon Printing Co Ltd

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Author

Publications (4)

Proceedings Article | 30 September 2009 Paper

6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Morihisa Hoga, Masaharu Fukuda, Tsuyoshi Chiba, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Nobuhito Toyama, Naoya Hayashi

Proceedings Volume 7488, 74881S (2009) https://doi.org/10.1117/12.833449

KEYWORDS: Silicon, Quartz, Photoresist processing, Nanoimprint lithography, Chemically amplified resists, Etching, Ultraviolet radiation, Photomasks, Thin films, Beam propagation method

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Proceedings Article | 11 May 2009 Paper

Adhesion control between resist patterns and photomask blank surfaces

Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Takaharu Nagai, Daisuke Totsukawa, Masaharu Fukuda, Yasutaka Morikawa, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi, Hiroyuki Ohtani, Masamichi Fujihira

Proceedings Volume 7379, 73790A (2009) https://doi.org/10.1117/12.824251

KEYWORDS: Chromium, Photomasks, Quartz, Surface roughness, Head-mounted displays, Scanning probe microscopy, Photoresist processing, Interfaces, Atomic force microscopy, Silicon

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Proceedings Article | 11 May 2009 Paper

Developing quartz wafer mold manufacturing process for patterned media

Tsuyoshi Chiba, Masaharu Fukuda, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Morihisa Hoga

Proceedings Volume 7379, 73792Q (2009) https://doi.org/10.1117/12.824340

KEYWORDS: Quartz, Semiconducting wafers, Manufacturing, Etching, Nanoimprint lithography, Beam propagation method, Reactive ion etching, Semiconductors, Printing, Metrology

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Proceedings Article | 11 May 2009 Paper

Si-mold fabrication for patterned media using high-resolution chemically amplified resist

Masaharu Fukuda, Tsuyoshi Chiba, Mikio Ishikawa, Kimio Itoh, Masaaki Kurihara, Morihisa Hoga

Proceedings Volume 7379, 73790L (2009) https://doi.org/10.1117/12.824262

KEYWORDS: Silicon, Nanoimprint lithography, Adhesives, Chemically amplified resists, Electron beam lithography, Head-mounted displays, Line edge roughness, Scanning electron microscopy, Ultraviolet radiation, Photoresist processing

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