Masaharu Fukuda
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74881S (2009) https://doi.org/10.1117/12.833449
KEYWORDS: Silicon, Quartz, Photoresist processing, Nanoimprint lithography, Chemically amplified resists, Etching, Ultraviolet radiation, Photomasks, Thin films, Beam propagation method

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790A (2009) https://doi.org/10.1117/12.824251
KEYWORDS: Chromium, Photomasks, Quartz, Surface roughness, Head-mounted displays, Scanning probe microscopy, Photoresist processing, Interfaces, Atomic force microscopy, Silicon

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792Q (2009) https://doi.org/10.1117/12.824340
KEYWORDS: Quartz, Semiconducting wafers, Manufacturing, Etching, Nanoimprint lithography, Beam propagation method, Reactive ion etching, Semiconductors, Printing, Metrology

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790L (2009) https://doi.org/10.1117/12.824262
KEYWORDS: Silicon, Nanoimprint lithography, Adhesives, Chemically amplified resists, Electron beam lithography, Head-mounted displays, Line edge roughness, Scanning electron microscopy, Ultraviolet radiation, Photoresist processing

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