Mr. Masahiko Okumura Profile

Masahiko Okumura

at Nikon Corp

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Author

Publications (3)

Proceedings Article | 10 March 2010 Paper

Illumination optics for source-mask optimization

Yasushi Mizuno, Tomoyuki Matsuyama, Soichi Owa, Osamu Tanitsu, Naonori Kita, Masahiko Okumura

Proceedings Volume 7640, 76401I (2010) https://doi.org/10.1117/12.846476

KEYWORDS: Fiber optic illuminators, Source mask optimization, Resolution enhancement technologies, Modulation, Lithographic illumination, Photomasks, Optical lithography, Zernike polynomials, Immersion lithography, Double patterning technology

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Proceedings Article | 7 March 2008 Paper

Recent performance results of Nikon immersion lithography tools

Andrew Hazelton, Kenichi Shiraishi, Shinji Wakamoto, Yuuki Ishii, Masahiko Okumura, Nobutaka Magome, Hiroyuki Suzuki

Proceedings Volume 6924, 69241N (2008) https://doi.org/10.1117/12.771823

KEYWORDS: Semiconducting wafers, Calibration, Immersion lithography, Sensors, Scanners, Critical dimension metrology, Lens design, Manufacturing, Imaging systems, Control systems

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Proceedings Article | 21 March 2006 Paper

Mass production level ArF immersion exposure tool

Masahiko Okumura, Jun Ishikawa, Masato Hamatani, Masahiro Nei

Proceedings Volume 6154, 61541U (2006) https://doi.org/10.1117/12.656349

KEYWORDS: Semiconducting wafers, Calibration, Polarization, Imaging systems, Water, Lithography, Wavefronts, Projection systems, Resonance energy transfer, Scanners

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