Masahiro Shoji
Sales Representative at Nippon Control System Corp
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Scattering, Laser scattering, Photomasks, Chemical species, Lithography, Molecules, Convolution, Modulation, Parallel processing, Critical dimension metrology

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Photomasks, Inspection, Logic, Manufacturing, Vestigial sideband modulation, Image transmission, System integration, Extreme ultraviolet, Diagnostics, Parallel processing

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Vestigial sideband modulation, Software development, Data conversion, Optical proximity correction, Photomasks, Mask making, Analytical research, Inspection, Logic, Scanning electron microscopy

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Vestigial sideband modulation, Data conversion, Software development, Optical proximity correction, Photomasks, Inspection, Analytical research, Electronics, Manufacturing, Data processing

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Electron beam lithography, Scattering, Laser scattering, Electron beams, Calibration, Semiconducting wafers, Analytical research, Photoresist processing, Hydrogen, Critical dimension metrology

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top