Dr. Endo Masakazu Profile

Dr. Endo Masakazu

Assistant Manager at Hitachi High-Tech Science Corp

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Publications (11)

Proceedings Article | 3 April 2010 Paper

Development of a design intent extraction flow for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7641, 76410K (2010) https://doi.org/10.1117/12.846334

KEYWORDS: Photomasks, Inspection, Manufacturing, Semiconductors, Analog electronics, Defect inspection, Optical proximity correction, Electronic design automation, Design for manufacturability, Design for manufacturing

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Proceedings Article | 23 September 2009 Paper

Mask data prioritization based on design intent - II

Masakazu Endo, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7488, 748824 (2009) https://doi.org/10.1117/12.829500

KEYWORDS: Photomasks, Inspection, Manufacturing, Data conversion, Design for manufacturing, Defect inspection, Data processing, Electronic design automation, Metals, Optical proximity correction

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Proceedings Article | 11 May 2009 Paper

Utilization of design intent information for mask manufacturing (II)

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7379, 737932 (2009) https://doi.org/10.1117/12.824352

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Analog electronics, Data conversion, Design for manufacturability, Semiconductors, Electronic design automation, Data processing

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Proceedings Article | 17 October 2008 Paper

Mask data prioritization based on design intent

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7122, 71223U (2008) https://doi.org/10.1117/12.801561

KEYWORDS: Photomasks, Inspection, Manufacturing, Semiconducting wafers, Data conversion, Design for manufacturing, Semiconductors, Design for manufacturability, Reticles, Data processing

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Proceedings Article | 19 May 2008 Paper

Utilization of design intent information for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7028, 702835 (2008) https://doi.org/10.1117/12.793112

KEYWORDS: Photomasks, Manufacturing, Inspection, Data conversion, Design for manufacturing, Design for manufacturability, Electronic filtering, Metals, Semiconductors, Databases

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Proceedings Article | 19 May 2008 Paper

Comparison of verification methods for OASIS files: hierarchical or flat?

Kokoro Kato, Yoshiyuki Taniguchi, Masakazu Endo, Kuninori Nishizawa, Tadao Inoue, Toshiaki Fujii

Proceedings Volume 7028, 702834 (2008) https://doi.org/10.1117/12.793111

KEYWORDS: Photomasks, Data conversion, Optical proximity correction, Parallel processing, Nanotechnology, Data modeling, Standards development, Data processing, Error analysis, Explosives

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Proceedings Article | 2 May 2008 Paper

Mask data rank (MDR) and its application

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 6792, 679209 (2008) https://doi.org/10.1117/12.798583

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Design for manufacturability, Electronic filtering, Semiconductors, Metals, Reticles

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Proceedings Article | 1 November 2007 Paper

Mask rule check using priority information of mask patterns

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Masakazu Endo, Tadao Inoue, Ryouji Hagiwara, Anto Yasaka

Proceedings Volume 6730, 67304F (2007) https://doi.org/10.1117/12.746549

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis

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Proceedings Article | 15 May 2007 Paper

Fast file size estimation of mask data conversion from OASIS to GDS2

Masakazu Endo, Yoshiyuki Taniguchi, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6607, 66072P (2007) https://doi.org/10.1117/12.729008

KEYWORDS: Data conversion, Photomasks, Data analysis, Error analysis, Standards development, Electronic design automation, Nanotechnology, Data processing, Data compression

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Proceedings Article | 20 May 2006 Paper

From GDSII to OASIS: practical support tools for data processing flow transition

Masakazu Endo, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6283, 62832P (2006) https://doi.org/10.1117/12.681802

KEYWORDS: Data conversion, Data processing, Photomasks, Nanotechnology, Electronic design automation, Software development, Standards development, Optical proximity correction, Data compression, Vestigial sideband modulation

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Proceedings Article | 28 June 2005 Paper

Effective IP protection method of mask data using OASIS format

Kuninori Nishizawa, Masakazu Endo, Kokoro Kato

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617152

KEYWORDS: Parallel processing, Photomasks, Image compression, Process control, Local area networks, Intellectual property, Data storage, Algorithm development, Control systems, Image processing

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Showing 5 of 11 publications

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