Masakazu Tokita
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 25 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Databases, Inspection, Image sensors, Image transmission, Photomasks, Source mask optimization, Data conversion, Semiconducting wafers

Proceedings Article | 16 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Defect detection, Databases, Inspection, Computer simulations, Photomasks, Source mask optimization, Optical proximity correction, Data conversion, Defect inspection

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Optical inspection, Telecommunications, Image transmission, Photomasks, SRAF, Semiconducting wafers

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

Proceedings Article | 11 May 2009 Paper
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

Showing 5 of 8 publications
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