Mr. Masashi Ataka Profile

Masashi Ataka

Director, Development Div at Holon Co Ltd

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Author

Publications (5)

Proceedings Article | 20 October 2006 Paper

Mask defect imaging system using backscattered electron images

Katsuyuki Takahashi, Masashi Ataka, Takao Namae

Proceedings Volume 6349, 63493P (2006) https://doi.org/10.1117/12.694530

KEYWORDS: Computer aided design, Photomasks, Imaging systems, Optical inspection, Scanning electron microscopy, Inspection, Air contamination, Defect inspection, Defect detection, Chromium

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Proceedings Article | 9 November 2005 Paper

CD measurement of angled lines on high-end masks and its calibration method

Masashi Ataka, Yasunobu Kitayama, Katsuyuki Takahashi, Naoyuki Nakamura, Izumi Santo, Hitomi Satoh, Norimichi Anazawa

Proceedings Volume 5992, 59924H (2005) https://doi.org/10.1117/12.632016

KEYWORDS: Critical dimension metrology, Calibration, Holons, Computer aided design, Standards development, Prototyping, Reliability, Data conversion, Optical proximity correction, Very large scale integration

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Proceedings Article | 9 November 2005 Paper

CD measurement of points indicated in photomask writing data

Hitomi Satoh, Masashi Ataka, Norimichi Anazawa

Proceedings Volume 5992, 59924G (2005) https://doi.org/10.1117/12.632000

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Raster graphics, Holons, Optical proximity correction, Computed tomography, Software development, Cadmium, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Calibration and long-term stability evaluation of photomask CD-SEM utilizing JQA standard

Izumi Santo, Masashi Ataka, Katsuyuki Takahashi, Norimiti Anazawa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468088

KEYWORDS: Calibration, Line edge roughness, Time metrology, Photomasks, Optical testing, Critical dimension metrology, Statistical analysis, Reticles, Edge roughness, Wafer-level optics

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Proceedings Article | 18 December 1998 Paper

CD guarantee for the next-generation photomasks with CD-SEM

Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Masashi Ataka, Jun Nitta

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332868

KEYWORDS: Chromium, Contamination, Photomasks, Critical dimension metrology, Scanning electron microscopy, Quartz, Reticles, Optics manufacturing, Electron beams, Holons

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